Abstract: A power system for a plasma processing system and associated methods are disclosed. The power system comprises a generator with a frequency-tuning subsystem, a match network coupled between the plasma processing chamber and the generator, and means for adjusting an impedance of the match network so the frequency-tuning subsystem adjusts a frequency of power applied by the generator to a target frequency while the match network presents a desired impedance to the generator in response to variations in an impedance of a plasma in a plasma processing chamber.

Abstract: A radio-frequency (RF) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem.

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract: A radio-frequency (RF) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem.

Abstract: A radio-frequency (RF) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem.

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract: This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.

Abstract: A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.

Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Abstract: A method for whitening teeth is disclosed. The method includes supplying a liquid sufficient to at least partially submerge a portion of a tooth; positioning a plasma device adjacent to the submerged portion of the tooth; supplying ionizable media to the plasma device; and igniting the ionizable media at the plasma device sufficient to form a plasma effluent in the presence of the liquid at the distal portion, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts selectively with foreign matter disposed on the tooth.

Abstract: A plasma system is disclosed. The system includes: a plasma device including at least one electrode; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; a precursor source configured to supply at least one precursor feedstock to the plasma device, wherein the at least one precursor feedstock includes at least one catalyst material; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media and the at least one precursor feedstock at the plasma device to form a plasma effluent.

Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Abstract: A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.

Abstract: A method for whitening teeth is disclosed. The method includes supplying a liquid sufficient to at least partially submerge a portion of a tooth; positioning a plasma device adjacent to the submerged portion of the tooth; supplying ionizable media to the plasma device; and igniting the ionizable media at the plasma device sufficient to form a plasma effluent in the presence of the liquid at the distal portion, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts selectively with foreign matter disposed on the tooth.