Patents by Inventor MyeongBo HAN

MyeongBo HAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180304430
    Abstract: A method of symmetrically chamfering a substrate includes repeating, at least a plurality of times, the steps of chamfering an edge of the substrate using a chamfering wheel, measuring an asymmetric chamfering deviation (y) of the edge of the substrate which is chamfered, and controlling a relative position of the chamfering wheel with respect to the substrate by a value of a function f(y) of the variable y. It is possible to constantly symmetrically chamfer the edge of the substrate via active response to a change in the chamfering environment without a hardware-based operation of the related art.
    Type: Application
    Filed: June 29, 2018
    Publication date: October 25, 2018
    Applicant: CORNING PRECISION MATERIALS CO., LTD.
    Inventor: MyeongBo HAN
  • Patent number: 9310176
    Abstract: A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: April 12, 2016
    Assignee: CORNING PRECISION MATERIALS CO., LTD.
    Inventor: MyeongBo Han
  • Publication number: 20140352163
    Abstract: A method of measuring a flatness of a chamfering table includes the steps of positioning a substrate on the chamfering table, chamfering an edge of the substrate a plurality of times with a chamfering wheel while varying a relative height of the chamfering wheel with respect to a height of the substrate, locating symmetric chamfered points where the chamfered edge is top-bottom symmetric, matching values of the relative height of the chamfering wheel to the found symmetric chamfered points, and obtaining the flatness of the chamfering table from the values of the relative height of the chamfering wheel that are matched to the symmetric chamfered points.
    Type: Application
    Filed: May 28, 2014
    Publication date: December 4, 2014
    Applicant: CORNING PRECISION MATERIALS CO., LTD.
    Inventor: MyeongBo HAN
  • Publication number: 20140357160
    Abstract: A method of symmetrically chamfering a substrate includes repeating, at least a plurality of times, the steps of chamfering an edge of the substrate using a chamfering wheel, measuring an asymmetric chamfering deviation (y) of the edge of the substrate which is chamfered, and controlling a relative position of the chamfering wheel with respect to the substrate by a value of a function f(y) of the variable y. It is possible to constantly symmetrically chamfer the edge of the substrate via active response to a change in the chamfering environment without a hardware-based operation of the related art.
    Type: Application
    Filed: May 27, 2014
    Publication date: December 4, 2014
    Applicant: CORNING PRECISION MATERIALS CO., LTD.
    Inventor: MyeongBo HAN