Abstract: A method of fabricating a multilayered thin film solid state battery device. The method steps include, but are not limited to, the forming of the following layers: substrate member, a barrier material, a first electrode material, a thickness of cathode material, an electrolyte, an anode material, and a second electrode material. The formation of the barrier material can include forming a polymer material being configured to substantially block a migration of an active metal species to the substrate member, and being characterized by a barrier degrading temperature. The formation of cathode material can include forming a cathode material having an amorphous characteristic, while maintaining a temperature of about ?40 Degrees Celsius to no greater than 500 Degrees Celsius such that a spatial volume is characterized by an external border region of the cathode material. The method can then involve transferring the resulting thin film solid state battery device.

Abstract: A method of fabricating a multilayered thin film solid state battery device. The method steps include, but are not limited to, the forming of the following layers: substrate member, a barrier material, a first electrode material, a thickness of cathode material, an electrolyte, an anode material, and a second electrode material. The formation of the barrier material can include forming a polymer material being configured to substantially block a migration of an active metal species to the substrate member, and being characterized by a barrier degrading temperature. The formation of cathode material can include forming a cathode material having an amorphous characteristic, while maintaining a temperature of about ?40 Degrees Celsius to no greater than 500 Degrees Celsius such that a spatial volume is characterized by an external border region of the cathode material. The method can then involve transferring the resulting thin film solid state battery device.