Patents by Inventor Myoung Ja Min

Myoung Ja Min has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming fine pattern of semiconductor device
    Patent number: 7494935
    Abstract: A method for forming a fine pattern of a semiconductor device includes forming a first photoresist film pattern over a semiconductor substrate including an underlying layer, exposing the first photoresist film pattern to generate an acid from the first photoresist film pattern, bleaching the first photoresist film pattern, and forming a second photoresist film pattern between the first photoresist patterns.
    Type: Grant
    Filed: February 26, 2007
    Date of Patent: February 24, 2009
    Assignee: Hynix Semiconductor Inc.
    Inventors: Jae Chang Jung, Seung Chan Moon, Cheol Kyu Bok, Myoung Ja Min, Keun Do Ban, Hee Youl Lim
  • METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE
    Publication number: 20080063985
    Abstract: A method for forming a fine pattern of a semiconductor device includes forming a first photoresist film pattern over a semiconductor substrate including an underlying layer, exposing the first photoresist film pattern to generate an acid from the first photoresist film pattern, bleaching the first photoresist film pattern, and forming a second photoresist film pattern between the first photoresist patterns.
    Type: Application
    Filed: February 26, 2007
    Publication date: March 13, 2008
    Applicant: Hynix Semiconductor Inc.
    Inventors: Jae Chang JUNG, Seung Chan Moon, Cheol Kyu Bok, Myoung Ja Min, Keun Do Ban, Hee Youl Lim