Patents by Inventor Myoung-Kwang Bae

Myoung-Kwang Bae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fuse boxes with guard rings for integrated circuits and integrated circuits including the same
    Patent number: 6809397
    Abstract: Integrated circuit devices and fuse boxes have a fuse line at a fuse portion of the integrated circuit device and a first insulating layer on the fuse line. A first guard ring pattern is provided that encloses the fuse line on the first insulating layer and a second insulating layer is provided on the first guard ring pattern and the first insulating layer. A second guard ring pattern that encloses the fuse line is provided on the second insulating layer and a passivation layer is provided on the second insulating layer and the second guard ring pattern. The passivation layer defines at least a portion of a fuse opening having a sidewall in the first and second insulating layers and extends on the sidewall of the fuse opening to at least the first insulating layer.
    Type: Grant
    Filed: January 6, 2004
    Date of Patent: October 26, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Myoung-Kwang Bae
  • Fuse boxes with guard rings for integrated circuits and integrated circuits including the same
    Publication number: 20040142526
    Abstract: Integrated circuit devices and fuse boxes have a fuse line at a fuse portion of the integrated circuit device and a first insulating layer on the fuse line. A first guard ring pattern is provided that encloses the fuse line on the first insulating layer and a second insulating layer is provided on the first guard ring pattern and the first insulating layer. A second guard ring pattern that encloses the fuse line is provided on the second insulating layer and a passivation layer is provided on the second insulating layer and the second guard ring pattern. The passivation layer defines at least a portion of a fuse opening having a sidewall in the first and second insulating layers and extends on the sidewall of the fuse opening to at least the first insulating layer.
    Type: Application
    Filed: January 6, 2004
    Publication date: July 22, 2004
    Inventor: Myoung-Kwang Bae
  • Methods of forming fuse box guard rings for integrated circuit devices
    Patent number: 6716679
    Abstract: The present invention provides methods of forming fuse box guard rings for integrated circuits and integrated circuit devices having the same. A fuse line is formed at a fuse portion of an integrated circuit device and a first insulating layer is formed on the fuse line. A guard ring pattern that encloses the fuse line is formed on the first insulating layer. A second insulating layer is formed on the guard ring pattern and the first insulating layer. The second insulating layer is partially etched to remove a portion of the second insulting layer in the fuse portion of the integrated circuit device enclosed by the guard ring pattern exposing a portion of the first insulating layer and to form a via hole in a peripheral circuit region of the integrated circuit device.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: April 6, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Myoung-Kwang Bae
  • Methods of forming fuse box guard rings for integrated circuit devices
    Publication number: 20030168715
    Abstract: The present invention provides methods of forming fuse box guard rings for integrated circuits and integrated circuit devices having the same. A fuse line is formed at a fuse portion of an integrated circuit device and a first insulating layer is formed on the fuse line. A guard ring pattern that encloses the fuse line is formed on the first insulating layer. A second insulating layer is formed on the guard ring pattern and the first insulating layer. The second insulating layer is partially etched to remove a portion of the second insulting layer in the fuse portion of the integrated circuit device enclosed by the guard ring pattern exposing a portion of the first insulating layer and to form a via hole in a peripheral circuit region of the integrated circuit device.
    Type: Application
    Filed: February 12, 2003
    Publication date: September 11, 2003
    Inventor: Myoung-Kwang Bae