Abstract: Disclosed is a pedestal heater block for a chemical vapor deposition machine, in which a structure intended for causing a vacuum to be applied is installed on a surface so that a wafer can be fixed by vacuum absorption, and which comprises: gas supply holes distributed to supply gas for temperature uniformity onto a back side of the wafer; and a hot wire configured to apply heat to the wafer, wherein the hot wire is installed to have higher installation density in a central part of the heater block which is a position corresponding to a central part of the wafer than that in a neighborhood part which is an outer side of the heater block.