Patents by Inventor Myung Keun Noh

Myung Keun Noh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9494065
    Abstract: Provided is an apparatus for processing exhaust fluid in which a fluid generated in a process chamber of an apparatus for manufacturing a semiconductor, a display panel, or a solar cell is ejected to the outside.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: November 15, 2016
    Assignee: LOT VACUUM CO., LTD.
    Inventors: Sang-Yun Lee, Myung Keun Noh, Heaungshig Oh
  • Publication number: 20150252472
    Abstract: Provided is a method for removing metallic by-products. The method includes depositing a metal precursor to form a metal layer in a process chamber, plasma treating an exhaust gas containing the residual metal precursor transferred from the process chamber, treating metallic by-products generated by the plasma treatment with an oxidizing gas to produce metal oxides, and discharging the metal oxides by pumping.
    Type: Application
    Filed: October 16, 2013
    Publication date: September 10, 2015
    Applicant: CLEAN FACTORS CO., LTD.
    Inventors: Gyoung O Ko, Myung keun Noh
  • Publication number: 20140004009
    Abstract: Provided is an apparatus for processing exhaust fluid in which a fluid generated in a process chamber of an apparatus for manufacturing a semiconductor, a display panel, or a solar cell is ejected to the outside.
    Type: Application
    Filed: December 27, 2011
    Publication date: January 2, 2014
    Applicant: LOT VACUUM CO., LTD.
    Inventors: Sang-Yun Lee, Myung Keun Noh, Heaungshig Oh
  • Publication number: 20100326599
    Abstract: Disclosed is an integrated vacuum producing apparatus, which vacuumizes a process chamber of an apparatus for manufacturing semiconductors, flat panel displays, etc. or exhausts gaseous material and by-products generated within the process chamber to an outside so as to purify it. Gaseous material, e.g. gas, generated within a chamber for manufacturing a semiconductor, a flat panel display, etc. is exhausted through each separate exhaust line so as to be purified. Therefore, excessive operation of a purifying system can be prevented through distribution of exhaust gas so that life span can be extended according to the operation of the apparatus. Also, exhausting can be smoothly achieved through each exhaust line so that it is possible to prevent delay of a semi-conductor manufacturing process due to inability of exhausting, and to easily remove non-reacted gas and by-products in an exhausting process.
    Type: Application
    Filed: May 16, 2008
    Publication date: December 30, 2010
    Inventors: Tae-Kyong Hwang, Heaung-Shig Oh, Myung-Keun Noh
  • Patent number: 7611340
    Abstract: A complex dry vacuum pump including a root rotor and a screw rotor is disclosed for manufacturing semiconductors and/or displays in a vacuum state in a process chamber, and discharging gaseous material and/or by-products generated during manufacturing to the exterior of the process chamber. The pump can provide high gas compression transfer efficiency so as to form a vacuum in the process chamber and/or keep high gas compression transfer efficiency when the gaseous material and/or by-products are discharged. Balance between the root rotor and the screw rotor can prevent vibration and noise generated in the vacuum pump, and molding material associated with the pump may allow a stator coil to be separated and prevent various by-products from flowing from the vacuum pump.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: November 3, 2009
    Assignee: LOT Vacuum Co., Ltd.
    Inventors: Tae-Kyong Hwang, Myung Keun Noh, Heaung Shig Oh