Abstract: A secondary battery module includes a plurality of battery cells aligned in one direction, a plurality of insulation sheets between the plurality of battery cells, the insulations sheets including aerogel for blocking heat transfer between the plurality of battery cells, and a housing fixing the battery cells and the insulation sheets. The secondary battery module may prevent or retard generation of heat or ignition from a cell within the module from propagating to adjoining cells.

Abstract: The present invention relates to a separator comprising a coating layer and a battery using the same, the separator having improved adhesive force to an electrode, thereby minimizing the rate of thickness change. More specifically, the present invention relates to a separator having a coating layer on one or both surfaces of a base film, the coating layer comprising an acrylic-based copolymer having a glass transition temperature of less than or equal to 80° C. and an inorganic particle, so as to have improved adhesive force and heat resistance, thereby being applicable in electrochemical batteries of various sizes and having excellent thermal stability and dimensional stability.

Abstract: A secondary battery module includes a plurality of battery cells aligned in one direction, a plurality of insulation sheets between the plurality of battery cells, the insulations sheets including aerogel for blocking heat transfer between the plurality of battery cells, and a housing fixing the battery cells and the insulation sheets. The secondary battery module may prevent or retard generation of heat or ignition from a cell within the module from propagating to adjoining cells.

Abstract: A separator includes a coating layer, the coating layer containing a polyvinylidene fluoride homopolymer, a polyvinylidene fluoride-hexafluoropropylene copolymer, a solvent, and inorganic particles, the solvent being present in an amount of about 100 ppm or less in the coating layer.

Abstract: The present invention relates to a separator comprising a coating layer and a battery using the same, the separator having improved adhesive force to an electrode, thereby minimizing the rate of thickness change. More specifically, the present invention relates to a separator having a coating layer on one or both surfaces of a base film, the coating layer comprising an acrylic-based copolymer having a glass transition temperature of less than or equal to 80° C. and an inorganic particle, so as to have improved adhesive force and heat resistance, thereby being applicable in electrochemical batteries of various sizes and having excellent thermal stability and dimensional stability.

Abstract: A porous separator including a porous base film; and a coating layer, the coating layer being on a surface of the porous base film and including a polyvinylidene fluoride homopolymer, a polyvinylidene fluoride-hexafluoropropylene copolymer, and inorganic particles, wherein the separator exhibits a thermal shrinkage of about 30% or less in a machine direction (MD) or in a transverse direction (TD), as measured after leaving the separator at 150° C. for 1 hour, a peel strength of about 50 gf/cm2 or more between the coating layer and the base film, and an adhesive strength of about 20 gf/cm2 or more between the coating layer and electrodes of a battery.

Abstract: A polyolefin porous separator includes a polyolefin porous base film, and a coating layer formed on one or both sides of the base film. The coating layer includes inorganic particles. The inorganic particles include first inorganic particles having an average particle size ranging from 150 nm to 600 nm, and second inorganic particles having an average particle size ranging from 5 nm to 90 nm. The separator has a thermal conductivity of 0.3 W/m·K or more.

Abstract: A composition for etching a silicon oxide layer, a method of etching a semiconductor device, and a composition for etching a semiconductor device including a silicon oxide layer and a nitride layer including hydrogen fluoride, an anionic polymer, and deionized water, wherein the anionic polymer is included in an amount of about 0.001 to about 2 wt % based on the total weight of the composition for etching a silicon oxide layer, and an etch selectivity of the silicon oxide layer with respect to a nitride layer is about 80 or greater.

Abstract: A polyolefin porous separator includes a polyolefin porous base film, and a coating layer formed on one or both sides of the base film. The coating layer includes inorganic particles. The inorganic particles include first inorganic particles having an average particle size ranging from 150 nm to 600 nm, and second inorganic particles having an average particle size ranging from 5 nm to 90 nm. The separator has a thermal conductivity of 0.3 W/m·K or more.

Abstract: A separator includes a base film and a coating layer on one or both sides of the base film, the coating layer being formed using a coating agent including a polyimide, an organic binder, and a solvent. A remaining amount of the solvent in the separator is about 100 ppm or less.

Abstract: A porous separator including a porous base film; and a coating layer, the coating layer being on a surface of the porous base film and including a polyvinylidene fluoride homopolymer, a polyvinylidene fluoride-hexafluoropropylene copolymer, and inorganic particles, wherein the separator exhibits a thermal shrinkage of about 30% or less in a machine direction (MD) or in a transverse direction (TD), as measured after leaving the separator at 150° C. for 1 hour, a peel strength of about 50 gf/cm2 or more between the coating layer and the base film, and an adhesive strength of about 20 gf/cm2 or more between the coating layer and electrodes of a battery.

Abstract: A separator includes a coating layer, the coating layer containing a polyvinylidene fluoride homopolymer, a polyvinylidene fluoride-hexafluoropropylene copolymer, a solvent, and inorganic particles, the solvent being present in an amount of about 100 ppm or less in the coating layer.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or more of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

Abstract: A composition for etching a silicon oxide layer, a method of etching a semiconductor device, and a composition for etching a semiconductor device including a silicon oxide layer and a nitride layer including hydrogen fluoride, an anionic polymer, and deionized water, wherein the anionic polymer is included in an amount of about 0.001 to about 2 wt % based on the total weight of the composition for etching a silicon oxide layer, and an etch selectivity of the silicon oxide layer with respect to a nitride layer is about 80 or greater.

Abstract: A non-aqueous electrolyte solution, including a lithium salt, an organic solvent, one or more succinic acid anhydride compounds, and one or more trialkylsilyl borate compounds.

Abstract: A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.