Abstract: A cleaning composition for removing post-etch or post-ash residues from a semiconductor substrate, and a cleaning method using the same are disclosed. The cleaning composition can comprise water; a fluorine compound; an alkanolamine compound; and a corrosion inhibitor. The corrosion inhibitor is a mixture of a first corrosion inhibitor and a second corrosion inhibitor. When using the cleaning composition, it is possible to efficiently remove the residues of various aspects existing on a surface of the substrate or the semiconductor device without damage to a substrate or a semiconductor device including various metal layers, insulating layers, etc. Accordingly, when a highly integrated and miniaturized semiconductor device is manufactured, it may be advantageously applied to the removal of residues generated on the surface of the substrate or the semiconductor device.

Abstract: Provided is a vehicle head-up display (HUD) device including a display unit divided into a first display area and a second display area; a folding mirror configured to reflect a first image to the first display area; a picture generation unit (PGU) configured to directly project the first image to the folding mirror; and a control unit configured to adjust a projection distance and a magnification and control the PGU to output the first image to the first image area and to output a second image to the second display area. Here, the first image is an virtual image, and the second image is an real image.