Patents by Inventor Myung-shik CHANG

Myung-shik CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
    Patent number: 10394117
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: August 27, 2019
    Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.
    Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
  • PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY
    Publication number: 20180259847
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Application
    Filed: May 11, 2018
    Publication date: September 13, 2018
    Applicants: Samsung Electronics Co., Ltd., Research & Business Foundation SUNGKYUNKWAN UNIVERSITY, Fine Semitech Co., Ltd.
    Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU
  • Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
    Patent number: 10001700
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: June 19, 2018
    Assignees: Samsung Electronics Co., Ltd., Research & Business Foundation Sungkyunkwan University, Fine Semitech Co., Ltd.
    Inventors: Mun Ja Kim, Ji-beom Yoo, Seul-gi Kim, Sang-jin Cho, Myung-shik Chang, Jang-dong You
  • PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY
    Publication number: 20160282712
    Abstract: A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.
    Type: Application
    Filed: June 3, 2014
    Publication date: September 29, 2016
    Applicants: Research & Business Foundation SUNGKYUNKWAN UNIVER SITY, Fine Semitech Co., Ltd.
    Inventors: Mun Ja KIM, Ji-beom YOO, Seul-gi KIM, Sang-jin CHO, Myung-shik CHANG, Jang-dong YOU