Patents by Inventor Myung-Su Heo

Myung-Su Heo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma-enhanced chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
    Patent number: 9663855
    Abstract: A plasma-enhanced chemical vapor deposition (“PECVD”) apparatus includes: an ejecting unit which is configured to eject a gas toward a substrate onto which the gas is deposited; a lift which is configured to support and selectively raise or lower a mask unit in which is defined a pattern through which the gas ejected from the ejecting unit passes towards the substrate; and a susceptor into which a portion of the lift is inserted, and which is configured to linearly move the substrate. A temperature of the lift is variable.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: May 30, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jung-Sik Lee, Myung-Su Heo, Seok-Won Jung
  • PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
    Publication number: 20150024147
    Abstract: A plasma-enhanced chemical vapor deposition (“PECVD”) apparatus includes: an ejecting unit which is configured to eject a gas toward a substrate onto which the gas is deposited; a lift which is configured to support and selectively raise or lower a mask unit in which is defined a pattern through which the gas ejected from the ejecting unit passes towards the substrate; and a susceptor into which a portion of the lift is inserted, and which is configured to linearly move the substrate. A temperature of the lift is variable.
    Type: Application
    Filed: October 30, 2013
    Publication date: January 22, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Jung-Sik Lee, Myung-Su Heo, Seok-Won Jung