Patents by Inventor Myung Yeol Kim

Myung Yeol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomers, polymers and photoresist compositions
    Patent number: 11487203
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: November 1, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
  • Monomers, polymers and photoresist compositions
    Patent number: 11480878
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 25, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
  • Method for forming pattern using antireflective coating composition including photoacid generator
    Patent number: 11269252
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 8, 2022
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION INCLUDING PHOTOACID GENERATOR
    Publication number: 20210026242
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • Coating composition for use with an overcoated photoresist
    Patent number: 10788751
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: September 29, 2020
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Matthew Grandbois, Myung Yeol Kim, Eui Hyun Ryu, Jae Hwan Sim, Min Kyung Jang, Jung-June Lee
  • COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS
    Publication number: 20200133126
    Abstract: A monomer represented by Chemical Formula (1): wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units derived from the monomer.
    Type: Application
    Filed: October 31, 2018
    Publication date: April 30, 2020
    Inventors: Jae Hwan Sim, Suwoong Kim, Jin Hong Park, Myung Yeol Kim, Yoo-Jin Ghang, Jae-Bong Lim
  • Photoresist compositions and methods
    Patent number: 10503073
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 10, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Min-Kyung Jang, Chang-Young Hong, Dong-Yong Kim, Dong-Je Hong, Hae-Jin Lim, Myung Yeol Kim, Hyun Jeon
  • Photobase generators and photoresist compositions comprising same
    Patent number: 10274824
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Min-Kyung Jang, Eui Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • Coating compositions for use with an overcoated photoresist
    Patent number: 10203602
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: February 12, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Myung-Yeol Kim, EunHye Cho, Jung-June Lee, Jae Hwan Sim
  • MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20180203352
    Abstract: Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
    Type: Application
    Filed: December 29, 2017
    Publication date: July 19, 2018
    Inventors: Eui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20180095367
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
    Type: Application
    Filed: September 30, 2016
    Publication date: April 5, 2018
    Inventors: Eui-Hyun Ryu, Myung-Yeol Kim, EunHye Cho, Jung-June Lee, Jae Hwan Sim
  • MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS
    Publication number: 20180059545
    Abstract: In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I): Photoresists that comprises such polymers also are provided.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 1, 2018
    Inventors: Eui Hyun Ryu, Min Kyung Jang, Jung Woo Kim, Kwang-Mo Choi, Hyun Jeon, Woo-Hyung Lee, Myung-Yeol Kim
  • COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20170059991
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Application
    Filed: August 31, 2016
    Publication date: March 2, 2017
    Inventors: Matthew Grandbois, Myung Yeol Kim, Eui Hyun Ryu, Jae Hwan Sim, Min Kyung Jang, Jung-June Lee
  • PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
    Publication number: 20160334703
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Application
    Filed: May 12, 2016
    Publication date: November 17, 2016
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong-Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • PHOTORESIST COMPOSITIONS AND METHODS
    Publication number: 20160320702
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Application
    Filed: April 29, 2016
    Publication date: November 3, 2016
    Inventors: Eui-Hyun Ryu, Min-Kyung Jang, Chang-Young Hong, Dong-Yong Kim, Dong-Je Hong, Hae-Jin Lim, Myung Yeol Kim, Hyun Jeon