Abstract: A semiconductor device includes a substrate, an active pattern extending in a first direction on the substrate, first and second nanosheets stacked on the active pattern to be spaced apart from each other in a vertical direction, a gate electrode that extends in a second direction the active pattern, the gate electrode surrounding each of the first and second nanosheets, a source/drain region on at least one side of the gate electrode, and inner spacers between the gate electrode and the source/drain region, the inner spacers including a first inner spacer between the active pattern and the first nanosheet, and a second inner spacer between the first nanosheet and the second nanosheet, the second inner spacer having a first portion adjacent to the first nanosheet, and a second portion adjacent to the second nanosheet, the first portion being wider than the second portion.

Abstract: A vehicle seat reinforcement device includes a leg portion mounted on a floor panel, a seat cushion frame slidably mounted on the leg portion, and a load reinforcing structure connected between the leg portion and the seat cushion frame, wherein when a seat belt anchorage load is transferred to the seat cushion frame, the seat cushion frame is locked to the leg portion by the load reinforcing structure.

Abstract: A semiconductor device includes an active pattern with a lower pattern and sheet patterns spaced apart from the lower pattern, a gate structure on the lower pattern and having a gate electrode and a gate insulating film that surround each of the sheet patterns, a gate capping pattern on the gate structure, a gate etching stop pattern between the gate capping pattern and the gate structure, a gate spacer along a sidewall of the gate capping pattern, a source/drain pattern on the gate structure, a gate contact through the gate capping pattern and connected to the gate electrode, upper surfaces of the gate contact and gate spacer being coplanar, and a source/drain contact on the source/drain pattern and connected to the source/drain pattern.

Abstract: A semiconductor device including a substrate; first and second active patterns on the substrate, extending in a first direction and spaced apart in a second direction; gate electrodes on the first and second active patterns and extending in the second direction; a first gate separation structure between the first and second active patterns, extending in the first direction, and separating the gate electrodes; and a first element separation structure between the gate electrodes, extending in the second direction, and separating the second active pattern, wherein a distance to a first side of a first portion of the first gate separation structure is smaller than a distance to the first side of a second portion of the first gate separation structure, and a distance to the second side of the first portion is smaller than a distance from the second active pattern to the second side of the second portion.

Abstract: A semiconductor device includes a substrate, an active pattern extending in a first direction on the substrate, first and second nanosheets stacked on the active pattern to be spaced apart from each other in a vertical direction, a gate electrode that extends in a second direction the active pattern, the gate electrode surrounding each of the first and second nanosheets, a source/drain region on at least one side of the gate electrode, and inner spacers between the gate electrode and the source/drain region, the inner spacers including a first inner spacer between the active pattern and the first nanosheet, and a second inner spacer between the first nanosheet and the second nanosheet, the second inner spacer having a first portion adjacent to the first nanosheet, and a second portion adjacent to the second nanosheet, the first portion being wider than the second portion.

Abstract: Disclosed are a solar cell and a method for manufacturing the same. The solar cell comprises asymmetric nanowires each of which has an angled sidewall, and thus incident light can be concentrated at a p-n junction portion by means of a total reflection phenomenon of light caused by the difference between the refractive indices of a semiconductor layer and a transparent electrode layer, and light absorption may increase due to an increase in the light travel distance, thus improving photoelectric efficiency. Further, the method for manufacturing the solar cell involves etching a substrate and integrally forming the substrate and a p-type semiconductor layer including the asymmetric nanowires each of which has the angled sidewalls, thereby enabling reduced manufacturing costs and simple and easy manufacture of the nanowires having the angled sidewalls.

Abstract: Disclosed are a solar cell and a method for manufacturing the same. The solar cell comprises asymmetric nanowires each of which has an angled sidewall, and thus incident light can be concentrated at a p-n junction portion by means of a total reflection phenomenon of light caused by the difference between the refractive indices of a semiconductor layer and a transparent electrode layer, and light absorption may increase due to an increase in the light travel distance, thus improving photoelectric efficiency. Further, the method for manufacturing the solar cell involves etching a substrate and integrally forming the substrate and a p-type semiconductor layer including the asymmetric nanowires each of which has the angled sidewalls, thereby enabling reduced manufacturing costs and simple and easy manufacture of the nanowires having the angled sidewalls.