Patents by Inventor N. Arul Dhas

N. Arul Dhas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of reducing defects in PECVD TEOS films
    Patent number: 7923376
    Abstract: The present invention provides high deposition rate PECVD methods for depositing TEOS films. The methods significantly reduce the number of particles in the TEOS films, thereby eliminating or minimizing defects. According to various embodiments, the methods involve adding a relatively small amount of helium gas to the process gas. The addition of helium significantly reduces the number of defects in the film, particularly for high deposition rate processes.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: April 12, 2011
    Assignee: Novellus Systems, Inc.
    Inventors: N. Arul Dhas, Jon Henri