Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.

Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.

Abstract: A device used as an instrument for microfabrication and/or nanofabrication featuring exchangeable module heads and multi-axis positioning of components. For example, a single module head can be adapted for carrying out photolithography, microcontact printing, and/or nanoimprint lithography. Another module head can be adapted to carry out different methods. The versatile device is used for training and is compact and relatively inexpensive. A working example for microcontact printing is provided.

Abstract: The silver electrode coated with carbon nanotubes is an indicator electrode for microtitrimetry by differential electrolytic potentiometry. The electrode is made by first positioning at least one silver wire electrode within a reaction zone of a floating catalyst chemical vapor deposition reactor. A ferrocene catalyst is evaporated within the floating catalyst chemical vapor deposition reactor, and an inlet gas is fed therein to carry the evaporated ferrocene catalyst into the reaction zone. The inlet gas includes hydrogen and a carbon source, such as acetylene. The reaction zone is then heated for deposition of carbon onto the at least one silver electrode to form at least one silver electrode coated with carbon nanotubes. The electrode is cooled and then removed from the reactor.

Abstract: Improved high density, hard tip arrays for use in patterning are provided. An article comprises a handle chip; and a silicon nitride membrane bonded to at least a portion of the handle chip. The silicon nitride membrane comprises an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane. Another article comprises an elastomeric backing member; and an array of tips disposed on the elastomeric backing member. The tips of the array comprise a refractory material. Methods of making such articles are also provided.

Abstract: Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.

Abstract: Additive repair of advanced photomasks with low temperature or optical curing via direct write lithographic printing with sharp tips and cantilevers. The optical properties of the materials formed from the ink can be tuned (e.g., n and k values). Sol gel inks, including silsesquioxane inks, can be used to form MoSi compositions. The repaired photomasks are resistant to washing under normal photomask washing conditions. AFM instrumentation can be used to perform the additive repair to provide the high resolution and registration.

Abstract: A method for direct-write patterning comprises providing a cantilever having a cantilever end, wherein the cantilever is a tipless cantilever; providing an ink disposed at the cantilever end; providing a substrate surface; and moving the cantilever end or moving the substrate surface so that ink is delivered from the cantilever end to the substrate surface. A method for direct writing of conductive metal or metal precursor comprises providing a tipless cantilever having a cantilever end; providing an ink disposed at the cantilever end, wherein the ink comprises one or more metals, one or more metallic nanoparticles, or one or more metal salts; providing a substrate surface; and contacting the cantilever end and the substrate surface so that ink is delivered from the cantilever end to the substrate surface.

Abstract: A new, low temperature method for directly writing conductive metal traces with micron and sub-micron sized features. In this method, a flat beam is used, such as an AFM cantilever, with or without a tip, to draw traces of metal precursor ink onto a substrate. The dimensions of the metal traces can be directly controlled by the geometry of the cantilever, so that one can controllably deposit traces from 1 micron to over 100 microns wide with microfabricated cantilevers. Cantilevers with sharp tips can be used to further shrink the minimum features sizes to sub-micron scale. The height of the features can be increased by building layers of similar or different material.

Abstract: An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.

Abstract: Methods of preparing pre-engineered surfaces using various nanolithography techniques to generate, isolate, and multiply homogeneous cell populations. Surfaces can be treated by etching before exposure to biological systems like cells. Stem cell applications are described.

Abstract: An apparatus for use in fabricating structures and depositing materials from tips to surfaces for patterning in direct-write mode, providing ability to travel macroscopic distances and yet provide for nanoscale patterning. Useful in small scale fabrication and nanolithography. The instrument can be compact and used on a laboratory bench or desktop. An apparatus comprising: at least one multi-axis assembly comprising a plurality of nanopositioning stages, at least one pen assembly, wherein the pen assembly and the multi-axis assembly are adapted for delivery of material from the pen assembly to a substrate which is positioned by the multi-axis assembly, at least one viewing assembly, at least one controller. Nanopositioning by piezoelectric methods and devices and motors is particularly useful. The apparatus can include integrated environmental chambers and housings, as well as ink reservoirs for materials to be delivered. The viewing assembly can be a microscope with a long working distance.

Abstract: To improve anticounterfeiting protection, a method for imprinting pharmaceutical unit compositions comprising: providing a pharmaceutical unit composition, partially coating the exterior of the composition with a coating, stamping the coating with a stamp comprising a plurality of identification features, wherein identification features from the stamp are at least partially transposed in the coating and form a barcode, wherein the plurality of identification features comprise at least one lateral dimension of about 1,000 nm or less. Other objects can be coated and stamped including currency and luxury goods.

Abstract: Better leveling procedures for patterning at the small scale including the nanoscale. A method comprising: providing at least one array of cantilevers comprising tips thereon, wherein the cantilevers comprise at least one relatively bright spot, or at least two relatively bright spots, near the tip upon viewing, providing a substrate, leveling the array and the substrate with respect to each other, wherein the relatively bright spot near the tip is viewed to determine a contact of the tip and substrate.

Abstract: Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.

Abstract: Improved patterning at small scale including nanoscale. A method comprising: providing at least one cantilever comprising at least one tip thereon, and a material deposited on the tip, contacting the cantilever with a substrate so that the material is deposited from the tip onto the substrate to form a material deposit, wherein the temperature of the substrate is adapted to control a size of the material deposit. A device comprising: at least one heat sink, at least one heating or cooling stage, at least one vacuum system, wherein the device is adapted to function with a substrate to be subjected to a material deposition and to keep the substrate temperature substantially constant during deposition.

Abstract: An article comprising: at least one solid substrate comprising at least one surface providing a surface area of at least one square millimeter, wherein the surface comprises a homogeneous array of material deposits which covers at least 90% of the surface area. Edge-to-edge patterning and large area substrates can be achieved. Applications include growth of cells.

Abstract: Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips (e.g., atomic force microscope tips, etc.) for deposition of ink materials including sol-gel inks. Additive methods can be combined with subtractive methods. Holes can be filled with nanostructures. Heights of the nanostructures filling the holes can be controlled without losing control of the lateral dimensions of the nanostructures. Phase shifters on phase shifting masks (PSMs) are additively repaired with selectively deposited sol-gel material that is converted to solid oxide, which has optical transparency and index of refraction adapted for the phase shifters repaired.

Abstract: An ink composition comprising: a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water, and wherein the composition is formulated for slow dry rate and proper viscosity for DPN. Also, a method comprising: depositing a composition onto a cantilever, wherein the composition comprises a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water. The composition can be used in direct writing onto surfaces to form patterns and arrays using cantilevers, microcontact printing, ink jet printing, and other methods. The composition is particularly useful for preparing nanoscale features and forming high quality continuous conductive lines and dots, including silver based lines and dots. Applications include surface repair.

Abstract: A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (?CP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the ?CP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step.