Abstract: Method for thermally-machining large area features, and screen-depositing metallurgy on a ceramic dielectric greensheet. The method comprises an improvement over the conventional integrated disposable mask process, and involves the steps of outlining the large feature areas through a masking film laminated to a greensheet, using a high intensity energy beam such as a laser beam, electron beam, photon beam, etc, forming a stencil sheet having corresponding large area feature openings, and laminating the stencil sheet in registration over the masking film. An adhesive sheet is pressed against the back of the stencil sheet, through the stencil openings, to adhere to the outline features on the masking film and to remove them when the stencil sheet is separated from the masking film. Conductive paste is applied to the greensheet, through the large feature openings in the masking film, and the electroded greensheet is fired for use in preparing multi-layer ceramic packages.

Abstract: A debris control system is provided for an electron-beam drilling apparatus having a chamber encompassing a drilling area and a calibration area. The debris control system includes a calibration-area shielding assembly which shields a calibration area of such apparatus from drilling-generated debris and an isolation assembly which isolates drilling-generated debris within such drilling area.

Abstract: A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.

Abstract: A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.

Abstract: A high precision system for machining substrates by means of an energy beam includes real time digital signal processor control and a deflection system providing control, within a predetermined field of the substrate, of the angle at which the beam machines the substrate. An electron beam is used in a vacuum chamber in a preferred embodiment. The system also includes an x-y table for positioning the substrate and may have provision for detecting the x-y position and angular misregistration of the substrate. Dynamic forms and stigmator control may be used to produce a uniform beam within the field. The system allows a high speed vector machining process, which optimizes the overall system throughput by minimizing the settling time of the deflection system.