Patents by Inventor Nabil R. Yazdani

Nabil R. Yazdani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of forming electronic devices by ion implanting
    Patent number: 8003306
    Abstract: A method of forming an electronic device is provided that includes forming a resist layer over a substrate having a first region, a second region, and a third region. The method further includes directing radiation through a reticle, wherein the reticle comprises different radiation zones having significantly different transmission values with respect to each other, and the first region is exposed to a significantly different amount of radiation as compared to the second region. The method also includes removing part of the resist layer to leave a remaining portion such that the second region of the resist layer is significantly thinner than the third region of the resist layer, and then ion implanting the substrate while the remaining portion of the resist layer overlies the substrate to form a first implant region and a second implant region having different depths.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: August 23, 2011
    Assignee: Spansion LLC
    Inventors: Eric Apelgren, Nabil R. Yazdani
  • METHODS OF FORMING ELECTRONIC DEVICES BY ION IMPLANTING
    Publication number: 20090155726
    Abstract: A method of forming an electronic device is provided that includes forming a resist layer over a substrate having a first region, a second region, and a third region. The method further includes directing radiation through a reticle, wherein the reticle comprises different radiation zones having significantly different transmission values with respect to each other, and the first region is exposed to a significantly different amount of radiation as compared to the second region. The method also includes removing part of the resist layer to leave a remaining portion such that the second region of the resist layer is significantly thinner than the third region of the resist layer, and then ion implanting the substrate while the remaining portion of the resist layer overlies the substrate to form a first implant region and a second implant region having different depths.
    Type: Application
    Filed: December 17, 2007
    Publication date: June 18, 2009
    Applicant: SPANSION LLC
    Inventors: Eric Apelgren, Nabil R. Yazdani