Patents by Inventor Nacib BENMAMMAR

Nacib BENMAMMAR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for patterned processing
    Patent number: 11600739
    Abstract: An apparatus for patterned processing includes a source of input gas, a source of energy suitable for generating a plasma from the input gas in a plasma region and a grounded sample holder configured for receiving a solid sample. The apparatus includes a mask arranged between the plasma region and the grounded sample holder, the mask having a first face oriented toward the plasma region and a second face oriented toward a surface of the solid sample to be processed, the mask including a mask opening extending from the first face to the second face, and an electrical power supply adapted for applying a direct-current bias voltage to the mask, and the mask opening being dimensioned and shaped so as to generate spatially selective patterned processing on the surface of the solid sample.
    Type: Grant
    Filed: May 18, 2018
    Date of Patent: March 7, 2023
    Assignees: TOTAL SA, ECOLE POLYTECHNIQUE, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
    Inventors: Bastien Bruneau, Erik Johnson, Pavel Bulkin, Nada Habka, Gilles Poulain, Nacib Benmammar
  • APPARATUS AND METHOD FOR PATTERNED PROCESSING
    Publication number: 20200185564
    Abstract: An apparatus for patterned processing includes a source of input gas, a source of energy suitable for generating a plasma from the input gas in a plasma region and a grounded sample holder configured for receiving a solid sample. The apparatus includes a mask arranged between the plasma region and the grounded sample holder, the mask having a first face oriented toward the plasma region and a second face oriented toward a surface of the solid sample to be processed, the mask including a mask opening extending from the first face to the second face, and an electrical power supply adapted for applying a direct-current bias voltage to the mask, and the mask opening being dimensioned and shaped so as to generate spatially selective patterned processing on the surface of the solid sample.
    Type: Application
    Filed: May 18, 2018
    Publication date: June 11, 2020
    Inventors: Bastien BRUNEAU, Erik JOHNSON, Pavel BULKIN, Nada HABKA, Gilles POULAIN, Nacib BENMAMMAR