Patents by Inventor Nadia Capolla

Nadia Capolla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Line-projection apparatus for arrays of diode-laser bar stacks
    Patent number: 8547641
    Abstract: In optical apparatus for illuminating a mask-plane with a line of light, a light source includes four fast-axis stacks of laser diode bars with fast and slow axis collimating arrangements providing four collimated beams of diode-laser light. A combination of a lens element and two diffraction gratings collects the four collimated beams and spreads the beams in the fast-axis direction such that the spread beams overlap in the mask plane to form a line of light having a length in the fast-axis-direction and a width in the slow-axis direction of the diode-laser bar stacks.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: October 1, 2013
    Assignee: Cohernet, Inc.
    Inventor: Nadia Capolla
  • LINE-PROJECTION APPARATUS FOR ARRAYS OF DIODE-LASER BAR STACKS
    Publication number: 20120113996
    Abstract: In optical apparatus for illuminating a mask-plane with a line of light, a light source includes four fast-axis stacks of laser diode bars with fast and slow axis collimating arrangements providing four collimated beams of diode-laser light. A combination of a lens element and two diffraction gratings collects the four collimated beams and spreads the beams in the fast-axis direction such that the spread beams overlap in the mask plane to form a line of light having a length in the fast-axis-direction and a width in the slow-axis direction of the diode-laser bar stacks.
    Type: Application
    Filed: November 9, 2010
    Publication date: May 10, 2012
    Applicant: Coherent, Inc.
    Inventor: Nadia CAPOLLA
  • Phase mask with spatially variable diffraction efficiency
    Patent number: 6545808
    Abstract: A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable this film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.
    Type: Grant
    Filed: February 10, 2000
    Date of Patent: April 8, 2003
    Assignees: Institut National d'Optique, StockerYale Canada Inc.
    Inventors: Peter Ehbets, Michel Poirier, Zhihong Xu, Nadia Capolla