Abstract: Producing a molded body made of opaque quartz glass includes providing SiO2 grains obtained by comminuting quartz glass having a purity of at least 99.9 wt % SiO2, forming a slurry containing a suspension liquid and the SiO2 grains and which has a total solids content, wet grinding the SiO2 grains in the slurry so as to form ground SiO2 grain particles, forming a porous green body from the slurry, and sintering the porous green body. To provide a low cost quartz glass, the wet grinding of the SiO2 grains takes place at least temporarily in the presence of SiO2 nanoparticles, the proportion of which in the total solids content of the slurry is in the range of 0.1 wt % to 10 wt %, and the slurry has a solids content in the range of 76 to 80 wt % after addition of the SiO2 nanoparticles and after the wet grinding.

Abstract: In a known method for producing a quartz glass component, a crystal formation layer containing a crystallization promoter is produced on a coating surface of a base body of quartz glass. Starting therefrom, to provide a method for producing a quartz glass component of improved thermal strength and long-term stability which displays a comparatively small deformation particularly also in the case of rapid heating-up processes, it is suggested according to one aspect that a porous crystal formation layer containing amorphous SiO2 particles is produced with a mean thickness in the range of 0.1 to 5 mm, and that a substance which contains cesium and/or rubidium is used as the crystallization promoter.

Abstract: A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 ?m.

Abstract: In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiO2 particles and coarse SiO2 reinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density DK1 are here embedded in a SiO2 matrix with a specific glass density DM. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density DK0 of which prior to the sintering treatment is lower than the specific glass density DM, and which due to the sintering treatment reach the specific density DK1 which differs from the specific glass density DM by less than 10%.

Abstract: A method for producing a pore-containing opaque quartz glass includes: (a) producing porous SiO2 granulate particles from synthetically produced SiO2, (b) thermally densifying the SiO2 granulate particles to form partly densified SiO2 granulate particles, (c) forming a dispersion from the partly densified SiO2 granulate particles, (d) comminuting the partly densified SiO2 granulate particles to form a slip containing comminuted SiO2 granulate particles, (e) shaping the slip into a shaped body and forming a porous SiO2 green body with a green density rG, and (f) sintering the SiO2 green body into opaque quartz glass. To produce opaque quartz glass that is also suited for the use of spray granulate, during step (b), partly densified SiO2 granulate particles are produced with a specific surface BET-(A) between 0.025 and 2.5 m2/g, and during step (d), comminuted SiO2 granulate particles are produced with a specific surface BET-(B) between 4 and 10 m2/g.

Abstract: A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 ?m.

Abstract: In a known method for producing a quartz glass component, a crystal formation layer containing a crystallization promoter is produced on a coating surface of a base body of quartz glass. Starting therefrom, to provide a method for producing a quartz glass component of improved thermal strength and long-term stability which displays a comparatively small deformation particularly also in the case of rapid heating-up processes, it is suggested according to one aspect that a porous crystal formation layer containing amorphous SiO2 particles is produced with a mean thickness in the range of 0.1 to 5 mm, and that a substance which contains cesium and/or rubidium is used as the crystallization promoter.

Abstract: In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 ?m.

Abstract: In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiO2 particles and coarse SiO2 reinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density DK1 are here embedded in a SiO2 matrix with a specific glass density DM. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density DK0 of which prior to the sintering treatment is lower than the specific glass density DM, and which due to the sintering treatment reach the specific density DK1 which differs from the specific glass density DM by less than 10%.

Abstract: In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 ?m.

Abstract: A method for producing a pore-containing opaque quartz glass includes: (a) producing porous SiO2 granulate particles from synthetically produced SiO2, (b) thermally densifying the SiO2 granulate particles to form partly densified SiO2 granulate particles, (c) forming a dispersion from the partly densified SiO2 granulate particles, (d) comminuting the partly densified SiO2 granulate particles to form a slip containing comminuted SiO2 granulate particles, (e) shaping the slip into a shaped body and forming a porous SiO2 green body with a green density rG, and (f) sintering the SiO2 green body into opaque quartz glass. To produce opaque quartz glass that is also suited for the use of spray granulate, during step (b), partly densified SiO2 granulate particles are produced with a specific surface BET-(A) between 0.025 and 2.5 m2/g, and during step (d), comminuted SiO2 granulate particles are produced with a specific surface BET-(B) between 4 and 10 m2/g.

Abstract: In a known composite material with a fused silica matrix there are regions of silicon-containing phase embedded. In order to provide a composite material which is suitable for producing components for use in high-temperature processes for heat treatment even when exacting requirements are imposed on impermeability to gas and on purity, it is proposed in accordance with the invention that the composite material be impervious to gas, have a closed porosity of less than 0.5% and a specific density of at least 2.19 g/cm3, and at a temperature of 1000° C. have a spectral emissivity of at least 0.7 for wavelengths between 2 and 8 ?m.