Patents by Inventor Nae-Ry Yu

Nae-Ry Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hard mask composition for spin-coating
    Patent number: 9899231
    Abstract: Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.
    Type: Grant
    Filed: January 15, 2016
    Date of Patent: February 20, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-hoon Kim, Nae-ry Yu, Boo-deuk Kim, Song-se Yi, Jung-sik Choi
  • Methods of forming hardmask material film
    Patent number: 9874812
    Abstract: Methods of forming a hardmask material film are provided.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: January 23, 2018
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Myeong-koo Kim, Nae-ry Yu, Won-ki Lee, Hyun-woo Kim, Song-se Yi, Min-soo Kim, Jae-yeol Baek, Hyun-ji Song
  • Methods of detecting inhomogeneity of a layer and apparatus for performing the same
    Patent number: 9528949
    Abstract: In a method of detecting inhomogeneity of a layer, an incident light may be irradiated to at least two regions of the layer at a first incident angle position. First reflected lights reflected from the two regions of the layer may be sensed. The incident light may be irradiated to the at least two regions of the layer at a second incident angle position. Second reflected lights reflected from the two regions of the layer may be sensed. The first reflected lights and the second reflected lights may be compared with each other to obtain the inhomogeneity of the layer. Thus, the layer having a spot may be found.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: December 27, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hoon Kim, Jin-A Ryu, Chang-Ho Lee, Dong-Won Kim, Jae-Ho Kim, Jung-Dae Park, Nae-Ry Yu, Pil-Kwon Jun
  • METHODS OF FORMING HARDMASK MATERIAL FILM
    Publication number: 20160225636
    Abstract: Methods of forming a hardmask material film are provided.
    Type: Application
    Filed: January 29, 2016
    Publication date: August 4, 2016
    Inventors: Myeong-koo KIM, Nae-ry YU, Won-ki LEE, Hyun-woo KIM, Song-se YI, Min-soo KIM, Jae-yeol BAEK, Hyun-ji SONG
  • HARD MASK COMPOSITION FOR SPIN-COATING
    Publication number: 20160211142
    Abstract: Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.
    Type: Application
    Filed: January 15, 2016
    Publication date: July 21, 2016
    Inventors: Jung-hoon Kim, Nae-ry Yu, Boo-deuk Kim, Song-se Yi, Jung-sik Choi
  • Methods of Detecting Inhomogeneity of a Layer and Apparatus for Performing the Same
    Publication number: 20140270078
    Abstract: In a method of detecting inhomogeneity of a layer, an incident light may be irradiated to at least two regions of the layer at a first incident angle position. First reflected lights reflected from the two regions of the layer may be sensed. The incident light may be irradiated to the at least two regions of the layer at a second incident angle position. Second reflected lights reflected from the two regions of the layer may be sensed. The first reflected lights and the second reflected lights may be compared with each other to obtain the inhomogeneity of the layer. Thus, the layer having a spot may be found.
    Type: Application
    Filed: March 5, 2014
    Publication date: September 18, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hoon Kim, Jin-A Ryu, Chang-Ho Lee, Dong-Won Kim, Jae-Ho Kim, Jung-Dae Park, Nae-Ry Yu, Pil-Kwon Jun