Patents by Inventor Nagao Kameji

Nagao Kameji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Layers used to prevent reticulation in photographic elements
    Patent number: 4056396
    Abstract: A photographic light-sensitive material including a support, a non-light sensitive uppermost layer consisting of at least one organic synthetic high polymer compound as a film forming material and at least one light-sensitive layer between the support and the uppermost layer, said organic high polymer compound being selected from the group consisting of the following polymers (A) to (F):polymer (A) comprising repeating units a.sub.1 and a.sub.2 ;______________________________________ a.sub.1 : ##STR1## 80 - 97 mol% a.sub.2 : ##STR2## 3 - 20 mol% ______________________________________Wherein M represents a cation, and m represents 0, 3 or 4;Polymer (B) comprising repeating units b.sub.1, b.sub.2 and b.sub.3 ; ______________________________________ b.sub.1 : ##STR3## 5 - 30 mol% b.sub.2 : ##STR4## 5 - 75 mol% b.sub.3 : ##STR5## 20 - 65 mol% ______________________________________Wherein R.sub.1 and R.sub.2 each represents --CH.sub.3 or --C.sub.2 H.sub.5, R.sub.3 and R.sub.5 each represents --H or --CH.sub.
    Type: Grant
    Filed: May 16, 1975
    Date of Patent: November 1, 1977
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ikutaro Horie, Takushi Miyazako, Shinji Sakaguchi, Nobuo Tsuji, Nagao Kameji