Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Abstract: An image projection system is provided. The system can be used for performing lithography. The system includes a deuterium light source, a converging lens coupled to the deuterium light source. The system includes an aperture configured to provide image tiling disposed adjacent to the converging lens. The system includes a movable stage disposed adjacent to the aperture. A method of fabricating an optical device is provided. The method includes depositing a resist over a substrate and determining an exposure pattern for the optical device. The method includes exposing a portion of the resist with a light beam based on the determined exposure pattern. Exposing the portion of the resist includes directing the light beam from a deuterium light source to the substrate and developing the resist.

Abstract: Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer.

Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Abstract: Recesses are formed on a front side and a rear side of a waveguide. A solid porogen material is spun onto the front side and the rear side and fills the recesses. First front and rear cap layers are then formed on raised formations of the waveguide and on the solid porogen material. The entire structure is then heated and the solid porogen material decomposes to a porogen gas. The first front and rear cap layers are porous to allow the porogen gas to escape and air to enter into the recesses. The air maximizes a difference in refractive indices between the high-index transparent material of the waveguide and the air to promote reflection in the waveguide from interfaces between the waveguide and the air.

Abstract: An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Abstract: An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer.