Patents by Inventor Nainesh J. Patel

Nainesh J. Patel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6432330
    Abstract: A system and method for making very small (e.g., 1 millimeter diameter) spherical shaped devices is disclosed. The system includes a supply system for providing predetermined amounts of raw material into a chamber, which is used for melting the raw material. The melted raw material is then provided to a dropper for measuring predetermined amounts of the melted raw material (droplets) and releasing the droplets into a drop tube, where they are cooled and solidified into spherical shaped silicon devices. The system includes a container of silicon powder in which the solidified spherical shaped devices are received from the drop tube, the container including a stirring mechanism for agitating the silicon powder. The system also includes a separating device for separating the powder from the solidified spherical shaped devices after the devices have been received into the container.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: August 13, 2002
    Assignee: Ball Semiconductor, Inc.
    Inventors: Murali Hanabe, Nainesh J. Patel
  • Patent number: 6426280
    Abstract: A method for doping crystals is disclosed. The method includes a receiver for receiving semiconductor spheres and doping powder. The semiconductor spheres and dopant powder are then directed to a chamber defined within an enclosure. The chamber maintains a heated, inert atmosphere with which to diffuse the dopant to the semiconductor spheres.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: July 30, 2002
    Assignee: Ball Semiconductor, Inc.
    Inventors: Evangellos Vekris, Nainesh J. Patel, Murali Hanabe
  • Publication number: 20020068463
    Abstract: An apparatus and method for depositing thin films on the surface of a device such as a spherical shaped devices is disclosed. The apparatus includes an enclosure containing a plurality of apertures. The apertures connect to conduits for inputting and outputting the devices as well as injecting and releasing different gases and/or processing constituents. A chamber is formed within the enclosure. Spherical shaped devices move through the input conduit where they are preheated by a furnace. The preheated devices then move into the chamber where chemical precursors are added. At this time, the gases and/or processing constituents react with the heated device thereby growing a thin film on its outer surface.
    Type: Application
    Filed: December 5, 2000
    Publication date: June 6, 2002
    Inventors: Tomohiro Funakoshi, Takefumi Kida, Nainesh J. Patel, Murali Hanabe
  • Publication number: 20020063351
    Abstract: A system and method for making very small (e.g., 1 millimeter diameter) spherical shaped devices is disclosed. The system includes a supply system for providing predetermined amounts of raw material into a chamber, which is used for melting the raw material. The melted raw material is then provided to a dropper for measuring predetermined amounts of the melted raw material (droplets) and releasing the droplets into a drop tube, where they are cooled and solidified into spherical shaped silicon devices. The system includes a container of silicon powder in which the solidified spherical shaped devices are received from the drop tube, the container including a stirring mechanism for agitating the silicon powder.
    Type: Application
    Filed: February 13, 2002
    Publication date: May 30, 2002
    Applicant: Ball Semiconductor, Inc.
    Inventors: Murali Hanabe, Nainesh J. Patel
  • Patent number: 6383287
    Abstract: A system and method for performing diffusion on a three-dimensional substrate is provided. The system includes a furnace for providing a doped (e.g., p-type) molten semiconductor material and a dropper for converting the molten semiconductor material into a series of uniformly sized droplets. The droplets are then provided to a first tube where they solidify into a semiconductor crystals. The semiconductor crystals are then heated for a predetermined period of time until an outer layer of the semiconductor crystals is melted. The melted outer layer can then be doped (e.g., n-type) and then allowed to re-solidify. As a result, a plurality of spherical shaped p-n devices is created.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: May 7, 2002
    Assignee: Ball Semiconductor, Inc.
    Inventors: Murali Hanabe, Nainesh J. Patel, Michael Perdue
  • Patent number: 6365493
    Abstract: A method for doping crystals is disclosed. The method includes a receiver for receiving semiconductor spheres and doping powder. The semiconductor spheres and dopant powder are then directed to a chamber defined within an enclosure. The chamber maintains a heated, inert atmosphere with which to diffuse the dopant to the semiconductor spheres.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: April 2, 2002
    Assignee: Ball Semiconductor, Inc.
    Inventors: Evangellos Vekris, Nainesh J. Patel, Murali Hanabe
  • Patent number: 6331477
    Abstract: A method for doping crystals is disclosed. The method includes a receiver for receiving semiconductor spheres and a dopant. The semiconductor spheres are heated to a molten state. The dopant is absorbed by the semiconductor spheres. The semiconductor spheres are cooled to produce doped semiconductor spheres. The method is performed in a non-contact environment.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: December 18, 2001
    Assignee: Ball Semiconductor, Inc.
    Inventors: Evangellos Vekris, Nainesh J. Patel, Murali Hanabe
  • Publication number: 20010041433
    Abstract: A method for doping crystals is disclosed. The method includes a receiver for receiving semiconductor spheres and doping powder. The semiconductor spheres and dopant powder are then directed to a chamber defined within an enclosure. The chamber maintains a heated, inert atmosphere with which to diffuse the dopant to the semiconductor spheres.
    Type: Application
    Filed: January 25, 2001
    Publication date: November 15, 2001
    Inventors: Evangellos Vekris, Nainesh J. Patel, Murali Hanabe
  • Patent number: 6264742
    Abstract: A system and method for processing crystals is disclosed. The system includes a receiver tube for receiving semiconductor granules. The granules are then directed to a chamber defined within an enclosure. The chamber maintains a heated, inert atmosphere with which to melt the semiconductor granules into a molten mass. A nozzle, located at one end of the chamber, creates droplets from the molten mass, which then drop through a long drop tube. As the droplets move through the drop tube, they form spherical shaped semiconductor crystals. The drop tube is heated and the spherical shaped semiconductor crystals may be single crystals. An inductively coupled plasma torch positioned between the nozzle and the drop tube melts the droplets, but leaving a seed in-situ, or the droplets may be melted and a seed injected in-situ. The seed can thereby facilitate crystallization.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: July 24, 2001
    Assignee: Ball Semiconductor Inc.
    Inventors: Evangellos Vekris, Nainesh J. Patel, Murali Hanabe
  • Patent number: 6074476
    Abstract: A system and method for forming spherical semiconductor crystals is disclosed. The system includes a receiver tube 18 for receiving semiconductor granules 104. The granules are then directed to a chamber 14 defined within an enclosure 20. The chamber maintains a heated, inert atmosphere with which to melt the semiconductor granules into a molten mass. A nozzle, 40, creates droplets from the molten mass, which then drop through a long drop tube 16. As the droplets move through the drop tube, they form spherical shaped semiconductor crystals 112. The drop tube is heated and the spherical shaped semiconductor crystals may be single crystals. An inductively coupled plasma torch positioned between the nozzle and the drop tube melts the droplets, but leaving a seed in-situ. The seed can thereby facilitate crystallization.
    Type: Grant
    Filed: December 10, 1998
    Date of Patent: June 13, 2000
    Assignee: Ball Semiconductor, Inc.
    Inventors: Murali Hanabe, Nainesh J. Patel, Evangellos Vekris