Patents by Inventor Nakaatsu Yoshimura
Nakaatsu Yoshimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8691496Abstract: A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.Type: GrantFiled: September 11, 2012Date of Patent: April 8, 2014Assignee: JSR CorporationInventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
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Patent number: 8663905Abstract: A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility.Type: GrantFiled: November 19, 2007Date of Patent: March 4, 2014Assignee: JSR CorporationInventors: Nakaatsu Yoshimura, Yousuke Konno
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Publication number: 20130004900Abstract: A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.Type: ApplicationFiled: September 11, 2012Publication date: January 3, 2013Applicant: JSR CorporationInventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
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Patent number: 8334338Abstract: A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.Type: GrantFiled: May 21, 2008Date of Patent: December 18, 2012Assignee: JSR CorporationInventors: Nakaatsu Yoshimura, Yousuke Konno
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Patent number: 8288073Abstract: This invention provides a method for resist under layer film formation, which can form a resist under layer film which can function as an anti-reflection film, is excellent in pattern transfer properties and etching resistance, and does not cause bending of a pattern even in the transfer of a fined pattern, and a composition for the resist under layer film for use in the method, and a method for pattern formation. The method for resist under layer film formation comprises the steps of coating a composition for resist under layer film formation (for example, a composition comprising a compound having a phenolic hydroxyl group, a solvent, and an accelerator) onto a substrate to be processed, and treating the formed coating film under an oxidizing atmosphere having an oxygen concentration of not less than 1% by volume and a temperature of 300° C. or higher to form a resist under layer film.Type: GrantFiled: September 18, 2007Date of Patent: October 16, 2012Assignee: JSR CorporationInventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
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Publication number: 20110251323Abstract: A composition for forming a resist lower layer film, which contains (A) a resin, (B) a butyl ether group-containing crosslinking agent and (C) a solvent.Type: ApplicationFiled: May 21, 2008Publication date: October 13, 2011Inventors: Nakaatsu Yoshimura, Yousuke Konno
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Patent number: 7749681Abstract: A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), wherein R1 represents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more R1s may be the same or different and two or more Xs may be the same or different.Type: GrantFiled: March 14, 2007Date of Patent: July 6, 2010Assignee: JSR CorporationInventors: Nakaatsu Yoshimura, Yousuke Konno, Hikaru Sugita, Junichi Takahashi
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Patent number: 7709182Abstract: An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.Type: GrantFiled: November 28, 2005Date of Patent: May 4, 2010Assignee: JSR CorporationInventors: Nakaatsu Yoshimura, Keiji Konno
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Publication number: 20100081082Abstract: A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility.Type: ApplicationFiled: November 19, 2007Publication date: April 1, 2010Applicant: JSR CORPORATIONInventors: Nakaatsu Yoshimura, Yousuke Konno
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Publication number: 20100028802Abstract: This invention provides a method for resist under layer film formation, which can form a resist under layer film which can function as an anti-reflection film, is excellent in pattern transfer properties and etching resistance, and does not cause bending of a pattern even in the transfer of a fined pattern, and a composition for the resist under layer film for use in the method, and a method for pattern formation. The method for resist under layer film formation comprises the steps of coating a composition for resist under layer film formation (for example, a composition comprising a compound having a phenolic hydroxyl group, a solvent, and an accelerator) onto a substrate to be processed, and treating the formed coating film under an oxidizing atmosphere having an oxygen concentration of not less than 1% by volume and a temperature of 300° C. or higher to form a resist under layer film.Type: ApplicationFiled: September 18, 2007Publication date: February 4, 2010Applicant: JSR CorporationInventors: Yousuke Konno, Nakaatsu Yoshimura, Fumihiro Toyokawa, Hikaru Sugita
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Publication number: 20090098486Abstract: A composition for forming a lower layer film comprises a polymer (A) having a naphthalene derivative structural unit shown by the following formula (1), wherein R1 represents a hydroxyl group and the like, X represents a substitutable alkylene group having 1 to 20 carbon atoms and the like, n represents 0 to 6, m represents 1 to 8, and n+m represents an integer from 1 to 8, provided that two or more R1s may be the same or different and two or more Xs may be the same or different.Type: ApplicationFiled: March 14, 2007Publication date: April 16, 2009Applicant: JSR CORPORATIONInventors: Nakaatsu Yoshimura, Yousuke Konno, Hikaru Sugita, Junichi Takahashi
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Patent number: 7514205Abstract: An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.Type: GrantFiled: March 16, 2006Date of Patent: April 7, 2009Assignee: JSR CorporationInventors: Nakaatsu Yoshimura, Keiji Konno, Norihiro Natsume
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Publication number: 20080124524Abstract: An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.Type: ApplicationFiled: November 28, 2005Publication date: May 29, 2008Inventors: Nakaatsu Yoshimura, Keiji Konno
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Patent number: 7169327Abstract: The dielectric-forming composition according to the invention is characterized by consisting of: composite particles for dielectrics in which part or all of the surfaces of inorganic particles with permittivity of 30 or greater are coated with a conductive metal or a compound thereof, or a conductive organic compound or a conductive inorganic material; and (B) a resin component constituted of at least one of a polymerizable compound and a polymer. In addition, another dielectric-forming composition according to the invention is characterized by containing: ultrafine particle-resin composite particles composed of (J) inorganic ultrafine particles with the average particle size of 0.Type: GrantFiled: January 24, 2002Date of Patent: January 30, 2007Assignee: JSR CorporationInventors: Nobuyuki Ito, Hideaki Masuko, Satomi Hasegawa, Nakaatsu Yoshimura
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Publication number: 20060264525Abstract: Photocatalytic coating compositions contain a photocatalytic material such as obtained by doping nitrogen atoms to an interstitial site of metal oxide crystals, a titanium compound having a specific structure, an organosilane hydrolysate having a specific structure, and an organosiloxane oligomer having a specific structure. The photocatalytic coating compositions can give coating films that exhibit adequate photocatalytic action even in an environment with less spectral components having wavelengths of 400 nm or below and more visible light, for example in an indoor environment and in vehicle interiors having UV protection glass, and that have high transparency. Further, the photocatalytic coating compositions have good storage stability of dispersions.Type: ApplicationFiled: March 4, 2004Publication date: November 23, 2006Applicant: JSR CorporationInventors: Takeshi Ohwaki, Takeshi Morikawa, Koyu Aoki, Kenichi Suzuki, Yasunori Taga, Tarou Kanamori, Nakaatsu Yoshimura, Satoshi Ishikawa, Akira Nishikawa
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Publication number: 20060223008Abstract: An antireflection film-forming composition having excellent coatability, capable of significantly inhibiting production of fine microbubbles and capable of forming an antireflection film with a sufficiently decreased standing-wave effect, and having excellent solubility in water and alkaline developers is provided. The composition comprises a polymer having at least one polymerization unit with a hydroxyl group-containing organic group on the side chain, preferably a copolymer having at least one recurring unit of the following formula (2) and/or at least one recurring unit of the following formula (3) and at least one recurring unit of the following formula (4), and/or a salt thereof: wherein R1 and R2 represent a hydrogen atom, a fluorine atom, or a monovalent organic group, m is an integer of 1-20, and A represents a divalent coupling means.Type: ApplicationFiled: March 16, 2006Publication date: October 5, 2006Inventors: Nakaatsu Yoshimura, Keiji Konno, Norihiro Natsume
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Publication number: 20060070551Abstract: Coating compositions are silane-based coating compositions containing (a) fine metal particles and/or fine metal oxide particles, and (b) a titanium compound of specific structure and/or (d) an organosiloxane oligomer of specific structure, and (c) a silane compound of specific structure. The silane-based coating compositions can give coating films having good dispersibility of fine particles (a) and high transparency even at high concentrations.Type: ApplicationFiled: August 7, 2003Publication date: April 6, 2006Applicant: JSR CorporationInventors: Tarou Kanamori, Nakaatsu Yoshimura, Akira Nishikawa
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Patent number: 6737169Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.Type: GrantFiled: January 30, 2002Date of Patent: May 18, 2004Assignee: JSR CorporationInventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi
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Publication number: 20030151032Abstract: The dielectric-forming composition according to the invention is characterized by consisting of:Type: ApplicationFiled: September 30, 2002Publication date: August 14, 2003Inventors: Nobuyuki Ito, Hideaki Masuko, Satomi Hasegawa, Nakaatsu Yoshimura
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Publication number: 20020146573Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.Type: ApplicationFiled: January 30, 2002Publication date: October 10, 2002Applicant: JSR CORPORATIONInventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi