Patents by Inventor Nalan LIV HAMARAT

Nalan LIV HAMARAT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope
    Patent number: 10651009
    Abstract: The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: May 12, 2020
    Assignee: DELMIC IP B.V.
    Inventors: Jacob Pieter Hoogenboom, Nalan Liv Hamarat, Pieter Kruit
  • Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope
    Publication number: 20170221675
    Abstract: The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.
    Type: Application
    Filed: July 20, 2015
    Publication date: August 3, 2017
    Applicant: DELMIC B.V.
    Inventors: Jacob Pieter HOOGENBOOM, Nalan LIV HAMARAT, Pieter KRUIT