Patents by Inventor Nam Hai PHAM

Nam Hai PHAM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11875827
    Abstract: The present disclosure generally relate to spin-orbit torque (SOT) devices. The SOT devices each comprise a non-magnetic layer, a free layer disposed in contact with the non-magnetic layer, and a bismuth antimony (BiSb) layer disposed over the free layer. The non-magnetic layer has a thickness of about 0.5 nm to about 2 nm. The BiSb layer has a thickness of about 5 nm to about 10 nm. The BiSb layer and the free layer have collective thickness between about 5 nm to about 20 nm. By reducing the thickness of the non-magnetic layer and BiSb layer, a read gap of each SOT device is reduced while enabling large inverse spin Hall angles and high signal-to-noise ratios.
    Type: Grant
    Filed: March 25, 2022
    Date of Patent: January 16, 2024
    Assignee: Western Digital Technologies, Inc.
    Inventors: Quang Le, Brian R. York, Xiaoyong Liu, Son T. Le, Cherngye Hwang, Michael A. Gribelyuk, Xiaoyu Xu, Kuok San Ho, Hisashi Takano, Julian Sasaki, Huy H. Ho, Khang H. D. Nguyen, Nam Hai Pham
  • Publication number: 20230306993
    Abstract: The present disclosure generally relate to spin-orbit torque (SOT) devices. The SOT devices each comprise a non-magnetic layer, a free layer disposed in contact with the non-magnetic layer, and a bismuth antimony (BiSb) layer disposed over the free layer. The non-magnetic layer has a thickness of about 0.5 nm to about 2 nm. The BiSb layer has a thickness of about 5 nm to about 10 nm. The BiSb layer and the free layer have collective thickness between about 5 nm to about 20 nm. By reducing the thickness of the non-magnetic layer and BiSb layer, a read gap of each SOT device is reduced while enabling large inverse spin Hall angles and high signal-to-noise ratios.
    Type: Application
    Filed: March 25, 2022
    Publication date: September 28, 2023
    Inventors: Quang LE, Brian R. YORK, Xiaoyong LIU, Son T. LE, Cherngye HWANG, Michael A. GRIBELYUK, Xiaoyu XU, Kuok San HO, Hisashi TAKANO, Julian SASAKI, Huy H. HO, Khang H. D. NGUYEN, Nam Hai PHAM
  • Patent number: 11637234
    Abstract: A magnetoresistive memory cell includes an MTJ element including a magnetization free layer and a pure spin injection source. The pure spin injection source includes a BiSb layer coupled to the magnetization free layer. By flowing an in-plane current through the BiSb layer, this arrangement is capable of providing magnetization reversal of the magnetization free layer.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: April 25, 2023
    Assignee: TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Nam Hai Pham, Huynh Duy Khang Nguyen
  • Publication number: 20230063084
    Abstract: According to one embodiment, a spin injection source comprising a half Heusler alloy-topological semi-metal that has a surface state of Dirac type and that is in contact with a ferromagnet. The half Heusler alloy-topological semi-metal supplies a spin current to the ferromagnet based on a current flowing in a direction parallel to a first surface that is in contact with the ferromagnet.
    Type: Application
    Filed: August 24, 2022
    Publication date: March 2, 2023
    Applicant: TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Nam Hai PHAM, Takanori SHIRAKURA, Tsuyoshi KONDO
  • Publication number: 20220060149
    Abstract: An oscillator includes a spin current source, and a free layer coupled to the spin current source. The free layer has a magnetization hard axis that is parallel to a quantization axis of a spin current injected by the spin Hall effect of the spin current source.
    Type: Application
    Filed: February 21, 2020
    Publication date: February 24, 2022
    Inventors: Nam Hai PHAM, Takanori SHIROKURA
  • Publication number: 20200279992
    Abstract: A magnetoresistive memory cell includes an MTJ element including a magnetization free layer and a pure spin injection source. The pure spin injection source includes a BiSb layer coupled to the magnetization free layer. By flowing and in-plane current through the BiSb layer, this arrangement is capable of providing magnetization reversal of the magnetization free layer.
    Type: Application
    Filed: September 14, 2018
    Publication date: September 3, 2020
    Inventors: Nam Hai PHAM, Huynh Duy Khang NGUYEN