Patents by Inventor Nam-hee You

Nam-hee You has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240105573
    Abstract: A power module for a vehicle, includes: a first substrate including a first metal circuit disposed on a 1-1st surface, and a first spacer extending from the first metal circuit in a first direction; a second substrate spaced from and facing the first substrate in a second direction, and including a second metal circuit disposed on a 2-1st surface facing the 1-1st surface, and a second spacer extending from the second metal circuit in the second direction; and a semiconductor chip disposed between the first substrate and the second substrate, the first spacer and the second spacer extending toward each other.
    Type: Application
    Filed: July 10, 2023
    Publication date: March 28, 2024
    Inventors: Jun Hee PARK, Sung Taek Hwang, Nam Sik Kong, Myung III You
  • Publication number: 20240088009
    Abstract: A power module for a vehicle, includes: a first substrate including a first metal circuit disposed on a 1-1st surface, and a first spacer extending from the first metal circuit in a first direction; a second substrate spaced from and facing the first substrate in a second direction, and including a second metal circuit disposed on a 2-1st surface facing the 1-1st surface, and a second spacer extending from the second metal circuit in the second direction; and a semiconductor chip disposed between the first substrate and the second substrate and including a power pad and a signal pad, the first spacer and the second spacer extending toward each other, and the second spacer including a 2-1st spacer connected to the power pad and a 2-2nd spacer connected to the signal pad.
    Type: Application
    Filed: April 21, 2023
    Publication date: March 14, 2024
    Applicants: Hyundai Motor Company, Kia Corporation
    Inventors: Jun Hee PARK, Sung Taek HWANG, Nam Sik KONG, Myung III YOU
  • Patent number: 6295864
    Abstract: An analysis system and method for a cleanroom environment is disclosed wherein on-line testing of water-soluble contaminants is performed by condensing water vapor from an air sample taken from the clean room. The condenser is connected to a analyzing unit that is used to measure and analyze the water-soluble contaminants in the condensed water received from the condensing unit.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: October 2, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-hee You, Soon-young Lee, Jung-sung Hwang, Kwang-young Kim
  • Patent number: 6176120
    Abstract: Methods of analyzing water-soluble contaminants comprise providing reference air streams having gaseous water present therein; condensing the reference air streams such that the gaseous water liquefies; pressurizing the liquefied water; and supplying the liquefied water to analyzers. Systems for analyzing water-soluble contaminants comprise air inlets that absorb reference air containing gaseous water therein; valves that control the flow of the reference air in fluid communication with the air inlets; condensers that condense the gaseous water in the reference air in fluid communication with the valves; pressurization pumps that pressurize the water condensed from the reference air in fluid communication with the condensers; and discharge pumps that discharge an excessive amount of water contained in the reference air.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: January 23, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-hee You, Dong-soo Lee, Sun-young Lee, Jung-sung Hwang
  • Patent number: 6015706
    Abstract: A novel isolated microorganism, Micrococcus luteus KCTC 0369BP, exhibits a linear survival curve versus the concentration of hydrogen peroxide and is thus useful in a method of determining the degree of sterilization of, for example, ultrapure water that has been sterilized by hydrogen peroxide. The novel isolated microorganism produces a surface polysaccharide and a catalase.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: January 18, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-seop Kim, Seung-uhn Kim, Nam-hee You, Soon-young Lee
  • Patent number: 5890367
    Abstract: An air conditioning system for a semiconductor clean room includes a chemical filter between an air conditioner including a humidifier and a ULPA filter of the clean room, for ionizing chemical impurities using moisture supplied from the humidifier and then adsorbing the ionized chemical impurities by using the chemical filter. The chemical filter is installed downstream of the humidifier, which applies phosphoric acid for the prevention of scale-formation. This downstream location allows the chemical filter to prevent the phosphoric acid from being included in the fresh air as a new chemical impurity, which makes regulation of temperature and humidity of the air possible without having to use a special and expensive pure steam system.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: April 6, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-hee You, Jung-sung Hwang, Gee-do Kim, Young-jin Han
  • Patent number: 5871812
    Abstract: An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.
    Type: Grant
    Filed: December 26, 1996
    Date of Patent: February 16, 1999
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Sung Hwang, Dong-Joo Lee, Nam-Hee You, Sang-Young Moon