Patents by Inventor Nam Quoc Ngo

Nam Quoc Ngo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130273609
    Abstract: Non-hydrophobic beads and methods to reversibly bind, normalize, store and in situ deliver primers to reactions including PCR. Also provided are instructions for preparing the beads. In the presence of an appropriate binding buffer, a bead can be used to bind and desalt primers from a crude solution of DMT-off primers. In the presence of an appropriate binding buffer, a bead can be used to bind and purify primers from a crude solution of DMT-on primers. A bead may bind a picomolar amount of DMT-on primers from a solution containing a plurality of crude DMT-on primers. Upon detritylation and washing, the resulting DMT-off primer bound bead may be used in PCR. Primers are released from the bead upon cycling the temperature. Primer bound beads are coated or silanized with hydrophobic reagents which ensures a gradual release of primers during the thermal cycling of the PCR reaction. Coating or silanization in turn enhances primer stability and long term storage.
    Type: Application
    Filed: June 30, 2011
    Publication date: October 17, 2013
    Applicant: Chemistry and Technology For Genes, Inc.
    Inventors: Nam Quoc Ngo, Hoc Thai Nguyen, Minh Tri Thi Dang, Ngoc Dieu Ngo, Laurent Jaquinod
  • Patent number: 8309496
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: November 13, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Nam Quoc Ngo, MacDonald Morris, Melvin Yamamoto, Jennifer Tan, Richard P. Rava
  • Publication number: 20120071361
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: October 14, 2011
    Publication date: March 22, 2012
    Applicant: AFFYMETRIX, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Patent number: 8067578
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: December 9, 2009
    Date of Patent: November 29, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Martin J Goldberg, Martin Diggelman, Earl A. Hubbell, Glenn H. McGall, Nam Quoc Ngo, MacDonald Morris, Melvin Yamamoto, Jennifer Tan, Richard P. Rava
  • Publication number: 20100331217
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: December 9, 2009
    Publication date: December 30, 2010
    Applicant: Affymetrix, INC.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Publication number: 20090062148
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: August 8, 2006
    Publication date: March 5, 2009
    Applicant: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn Mcgall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Patent number: 7026114
    Abstract: VLSIPS™ manufacturing processes are of increasing commercial importance. The present invention provides methods and compositions for monitoring the efficiency and quality of polymer synthesis in VLSIPS™ arrays. Methods for monitoring polymer synthesis in an array on a substrate are provided. Monoisomeric labels for the labeling of synthetic polymer arrays are provided. Methods and compositions for post-synthetically labeling polymers in polymer arrays are also provided.
    Type: Grant
    Filed: November 30, 1995
    Date of Patent: April 11, 2006
    Assignee: Affymetrix, Inc.
    Inventors: Anthony D. Barone, Glenn H. Mc Gall, Evelyn Chai, Nam Quoc Ngo
  • Publication number: 20040105932
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Application
    Filed: November 25, 2003
    Publication date: June 3, 2004
    Applicant: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Patent number: 6706875
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: November 20, 2000
    Date of Patent: March 16, 2004
    Assignee: Affyemtrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Patent number: 6307042
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: February 4, 1999
    Date of Patent: October 23, 2001
    Assignee: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, MacDonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava
  • Patent number: 5959098
    Abstract: The present invention provides novel processes for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. The methods of the invention combine high throughput process steps with high resolution photolithographic techniques in the manufacture of polymer arrays.
    Type: Grant
    Filed: April 17, 1996
    Date of Patent: September 28, 1999
    Assignee: Affymetrix, Inc.
    Inventors: Martin Goldberg, Martin Diggelman, Earl Hubbell, Glenn McGall, Nam Quoc Ngo, Macdonald Morris, Mel Yamamoto, Jennifer Tan, Richard P. Rava