Abstract: An imprinting photomask including: a transparent substrate; a light blocking pattern provided on the transparent substrate; and a dry film resist (DFR) pattern provided on the light blocking pattern.

Abstract: The present application relates to a method for producing a substrate which includes a step of exposing and developing a photosensitive resin composition layer formed on a surface of a substrate base layer to produce spacers. The method for producing a substrate of the present application can uniformly form spacers having a height according to a desired cell gap and can also freely control the height of the spacers.

Abstract: A variable transmittance film includes a first electrode substrate and a second electrode substrate which are provided to face each other; and a liquid receiving layer which is provided between the first electrode substrate and the second electrode substrate and comprises a liquid substance, and a partition wall pattern that divides the liquid substance into two or more spaces, in which at least a part of the partition wall pattern comprises a passageway region that connects the adjacent spaces.

Abstract: A partition wall pattern film according to the exemplary embodiment of the present application comprises: including a transparent substrate; a first electrode layer provided on the transparent substrate; a partition wall pattern provided on the first electrode layer; and a second electrode layer pattern provided on an entire upper surface of the partition wall pattern and at least a part of a lateral surface of the partition wall pattern.

Abstract: A substrate and a method for producing the same are disclosed herein. In some embodiments, a substrate includes a base layer, a black layer formed on the base layer, and column spacers formed on the black layer, wherein a loss rate of spacers measured by a peel test is 15% or less. The substrate can have excellent adhesiveness of the spacer to the base layer or the black layer and ensuring appropriate darkening properties. The method can effectively produce such a substrate without adverse effects such as occurrence of foreign materials without separate treatment such as heat treatment.

Abstract: Provided is a black partition wall pattern film that comprises: a transparent substrate; an electrode layer provided on the transparent substrate; a black partition wall pattern provided on the electrode layer; and a black UV-curable resin layer provided in a region of the electrode layer where no black partition wall pattern is provided.

Abstract: A substrate having a spacer thereon and an optical device including the same are disclosed herein. In some embodiments, a substrate includes a base layer, a transparent column spacer formed on the base layer, and a black layer present between the transparent column spacer and the base layer. In some embodiments, an alignment film is present on the spacer.

Abstract: A substrate having a spacer formed thereon, a method of making the same, and an optical device including the same are disclosed herein. In one embodiment, a substrate includes a base layer, and a black column spacer formed on the base layer, wherein the black column spacer has an optical density in a range of 1.1 to 4, and wherein the black column spacer having a curved portion, wherein a cross section of the curved portion having at least one region having curvature.

Abstract: A substrate on which spacers are disposed in a certain arrangement state and an optical device using such a substrate are provided. A plurality of spacers are irregularly disposed on a substrate depending on a predetermined rule, so that overall uniform optical characteristics can be ensured without causing a so-called moire phenomenon or the like, while the spacers maintain the uniform cell gap in the construction of the optical device.

Abstract: A substrate on which a specific type spacer is formed, a substrate comprising an alignment film formed on the spacer, and an optical device using such a substrate are disclosed herein. By controlling the shape of the spacer formed on the substrate, even when the alignment film is formed on the top of the spacer and the orientation treatment is performed, the uniform orientation treatment can be performed without any influence by the step or the like of the spacer, whereby a substrate or the like capable of providing a device having excellent optical performance can be provided.

Abstract: The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and an embossed pattern part provided on a surface of the transparent substrate, which is provided with the darkened light-shielding pattern layer, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern formed by using the same.

Abstract: The present application relates to a film mask comprising: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and groove portions provided in a region where the darkened light-shielding pattern layer is not provided, a method for manufacturing the same, a method for forming a pattern by using the same, and a pattern manufactured by using the same.

Abstract: The present application relates to a film mask including: a transparent substrate; a darkened light-shielding pattern layer provided on the transparent substrate; and a release force enhancement layer provided on the darkened light-shielding pattern layer and having surface energy of 30 dynes/cm or less, a method for manufacturing the same, and a method for forming a pattern using the film mask.

Abstract: The present specification relates to an aluminum oxide composition, a substrate including the same, and a method for manufacturing the same.