Patents by Inventor Nami Kosaka

Nami Kosaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser irradiation apparatus and method for manufacturing semiconductor device using the laser irradiation apparatus
    Patent number: 7615424
    Abstract: An object of the present invention is to provide a laser irradiation method being able to control the irradiation position of the laser beam accurately compared with the conventional irradiation method. Another object of the present invention is to provide a method for manufacturing a semiconductor device with the use of the laser irradiation method being able to irradiate a large substrate accurately with the laser beam. The irradiation position of the laser beam is controlled by using a laser oscillator emitting a laser beam, an optical system for shaping the laser beam into rectangular on the irradiation object, means for moving the irradiation object relative to the laser beam in the long-side direction and the short-side direction of the beam spot, means for moving the irradiation object more slowly in the long-side direction than in the short-side direction, and a laser positioning mechanism.
    Type: Grant
    Filed: March 24, 2005
    Date of Patent: November 10, 2009
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto, Nami Kosaka
  • Laser irradiation apparatus and method for manufacturing semiconductor device using the laser irradiation apparatus
    Publication number: 20050214986
    Abstract: An object of the present invention is to provide a laser irradiation method being able to control the irradiation position of the laser beam accurately compared with the conventional irradiation method. Another object of the present invention is to provide a method for manufacturing a semiconductor device with the use of the laser irradiation method being able to irradiate a large substrate accurately with the laser beam. The irradiation position of the laser beam is controlled by using a laser oscillator emitting a laser beam, an optical system for shaping the laser beam into rectangular on the irradiation object, means for moving the irradiation object relative to the laser beam in the long-side direction and the short-side direction of the beam spot, means for moving the irradiation object more slowly in the long-side direction than in the short-side direction, and a laser positioning mechanism.
    Type: Application
    Filed: March 24, 2005
    Publication date: September 29, 2005
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Koichiro Tanaka, Yoshiaki Yamamoto, Nami Kosaka