Patents by Inventor Nami Onimaru

Nami Onimaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation-sensitive negative resin composition
    Publication number: 20070231747
    Abstract: A process is provided whereby thick platings such as bumps and wirings are produced with high precision while a resist shows high swelling resistance to a plating solution and the plating solution is prevented from leaking in between the pattern and substrate. A radiation-sensitive negative resin composition shows high sensitivity in the production process and possesses excellent resolution and heat resistance. A transfer film includes the composition.
    Type: Application
    Filed: March 30, 2007
    Publication date: October 4, 2007
    Applicant: JSR Corporation
    Inventors: Nami Onimaru, Hiroko Sakai