Abstract: A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.

Abstract: A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Abstract: A data archiving controller automatically determines a whether a main storage devices has usage ratio in excess of a maximum limit and if an archiving or backing storage device has sufficient directory space to accept files from the main storage devices. The data archiving controller then determines using fuzzy logic the number of files to be transferred from the main storage devices to the backing storage devices. The data archiving controller has a set allocating apparatus in communication with the main storage device and the backing storage devices to receive retention device usage parameters for classification within classification sets. A membership rules retaining device contains the classification parameter defining rules by which the retention device usage parameters are assigned to the classification sets. The archiving controller has a rule evaluation apparatus for determining a quantity of data to be archived.

Abstract: A method for estimating a remaining lifetime of a part in a piece of semiconductor fabrication equipment comprises the steps of: selecting a plurality of factors relevant to the remaining lifetime of the part, and estimating the remaining lifetime of the part by a fuzzy inference. The plurality of factors include a number of semiconductor wafers that have been processed by the piece of semiconductor fabrication equipment since the part was installed in the piece of equipment.

Abstract: A data archiving controller automatically determines a whether a main storage devices has usage ratio in excess of a maximum limit and if an archiving or backing storage device has sufficient directory space to accept files from the main storage devices. The data archiving controller then determines using fuzzy logic the number of files to be transferred from the main storage devices to the backing storage devices. The data archiving controller has a set allocating apparatus in communication with the main storage device and the backing storage devices to receive retention device usage parameters for classification within classification sets. A membership rules retaining device contains the classification parameter defining rules by which the retention device usage parameters are assigned to the classification sets. The archiving controller has a rule evaluation apparatus for determining a quantity of data to be archived.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

Abstract: Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.