Patents by Inventor Na Na KANG
Na Na KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11732072Abstract: A neutral layer composition and a neutral layer formed from the same are disclosed herein. In some embodiments, a neutral layer composition includes a random copolymer having a unit represented by Formula 1, and a unit containing an aromatic structure having one or more halogen atoms, wherein the molar amount of the unit represented by Formula 1 is present in a range of 9 mol % to 32 mol %, based on the total molar amount of the copolymer. The neutral layer can effectively control orientation characteristics of various block copolymers deposited thereon.Type: GrantFiled: July 16, 2018Date of Patent: August 22, 2023Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
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Patent number: 11613599Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.Type: GrantFiled: November 7, 2018Date of Patent: March 28, 2023Inventors: Eung Chang Lee, Mi Sook Lee, Se Jin Ku, Na Na Kang, Hyung Ju Ryu, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Yoon Hyung Hur
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Patent number: 11530283Abstract: A laminate and a method for producing a patterned substrate using the same are disclosed herein. In some embodiments, a laminate includes a substrate, and a stripe pattern having first and second polymer lines alternately and repeatedly disposed on the substrate, wherein the first polymer line comprises a first polymer having a first polymerized unit having a ring structure connected to a main chain and a second polymerized unit represented by Formula 1. The method may be applied to manufacture of devices, such as electronic devices, or of applications, such as integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and may be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.Type: GrantFiled: September 17, 2018Date of Patent: December 20, 2022Inventors: Na Na Kang, Se Jin Ku, Mi Sook Lee, Eung Chang Lee, Eun Young Choi, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Hyung Ju Ryu, Yoon Hyung Hur
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Patent number: 11286516Abstract: Disclosed is a method of designing a valid primer pair satisfying a specificity condition. The method includes searching for an identifier of a base sequence from a genetic information index based on a query language associated with a gene, searching for a candidate primer from a provided candidate primer set index to satisfy the specificity condition based on the identifier of the base sequence, filtering the candidate primer based on primer-related filtering conditions, and providing information about a primer pair satisfying the query language and the filtering conditions based on a result of the filtering.Type: GrantFiled: April 26, 2017Date of Patent: March 29, 2022Assignee: Daegu Gyeongbuk Institute of Science and TechnologyInventors: Min Soo Kim, Hyerin Kim, Jaehyung Koo, Na Na Kang, KyuHyeon An
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Patent number: 11062790Abstract: A method for designing all coverage of valid primer pairs, which satisfy various filtering constraints provided by users with respect to a given sequence database and has validated specificity to given sequences, is provided. By screening all suitable primer pairs present on a given DNA sequence database without omitting any one primer pair and also screening all primers having a coverage of 1 or more as well as primers having a coverage of 1, a user can be allowed to give rankings to the primers in order to easily select the primers having a high success rate in biological experiments from the resulting primers.Type: GrantFiled: August 12, 2015Date of Patent: July 13, 2021Assignee: DAEGU GYEONGBUK INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Min Soo Kim, Jae Hyung Koo, Hye Rin Kim, Na Na Kang, Kang Wook Chon, Seon Ho Kim
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Publication number: 20200391490Abstract: A neutral layer composition and a neutral layer formed from the same are disclosed herein. In some embodiments, a neutral layer composition includes a random copolymer having a unit represented by Formula 1, and a unit containing an aromatic structure having one or more halogen atoms, wherein the molar amount of the unit represented by Formula 1 is present in a range of 9 mol % to 32 mol %, based on the total molar amount of the copolymer. The neutral layer can effectively control orientation characteristics of various block copolymers deposited thereon.Type: ApplicationFiled: July 16, 2018Publication date: December 17, 2020Applicant: LG Chem, Ltd.Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
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Publication number: 20200354487Abstract: A method for producing a polymer containing metal atoms or halogen atoms at the terminals thereof with excellent efficiency while minimizing or eliminating side reactions or the like is provided. The method can also freely control molecular weight characteristics of the polymer.Type: ApplicationFiled: July 16, 2018Publication date: November 12, 2020Applicant: LG Chem, Ltd.Inventors: Yoon Hyung HUR, Je Gwon LEE, Sung Soo YOON, No Jin PARK, Eun Young CHOI, Se Jin KU, Mi Sook LEE, Hyung Ju RYU, Na Na KANG, Eung Chang LEE
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Publication number: 20200347005Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.Type: ApplicationFiled: November 7, 2018Publication date: November 5, 2020Applicant: LG Chem, Ltd.Inventors: Eung Chang Lee, Mi Sook Lee, Se Jin Ku, Na Na Kang, Hyung Ju Ryu, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Yoon Hyung Hur
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Publication number: 20200254714Abstract: A laminate and a method for producing a patterned substrate using the same are disclosed herein. In some embodiments, a laminate includes a substrate, and a stripe pattern having first and second polymer lines alternately and repeatedly disposed on the substrate, wherein the first polymer line comprises a first polymer having a first polymerized unit having a ring structure connected to a main chain and a second polymerized unit represented by Formula 1. The method may be applied to manufacture of devices, such as electronic devices, or of applications, such as integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and may be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.Type: ApplicationFiled: September 17, 2018Publication date: August 13, 2020Applicant: LG Chem, Ltd.Inventors: Na Na Kang, Se Jin Ku, Mi Sook Lee, Eung Chang Lee, Eun Young Choi, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Hyung Ju Ryu, Yoon Hyung Hur
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Publication number: 20200239701Abstract: The present application relates to a pinning composition, a laminate comprising the same, and a method for producing the same. The pinning composition of the present application can impart directionality and location selection properties to a polymer membrane comprising a self-assembly structure of a block copolymer. The pinning composition of the present application exhibits excellent reaction selectivity, whereby it can form a vertical lamella structure with a high degree of alignment. In addition, the pinning composition of the present application may be suitable for application to low temperature processes.Type: ApplicationFiled: October 29, 2018Publication date: July 30, 2020Applicant: LG Chem, Ltd.Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
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Patent number: 10647723Abstract: This invention relates to a photocleavable mass tag and the use thereof, and particularly to a thiochromene-type compound useful for MALDI-TOF (Matrix-Assisted Laser Desorption/Ionization Time-Of-Flight) mass spectrometry or matrix-less LDI-TOF (Laser Desorption/Ionization Time-Of-Flight) mass spectrometry and the use thereof.Type: GrantFiled: June 18, 2015Date of Patent: May 12, 2020Assignee: SOGANG UNIVERSITY RESEARCH FOUNDATIONInventors: Bong-Jin Moon, Han-Bin Oh, Na-Na Kang, Ae-Ran Jeon, Kye-Shin Park, Je-Hyun Baek
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Publication number: 20190375758Abstract: This invention relates to a photocleavable mass tag and the use thereof, and particularly to a thiochromene-type compound useful for MALDI-TOF (Matrix-Assisted Laser Desorption/Ionization Time-Of-Flight) mass spectrometry or matrix-less LDI-TOF (Laser Desorption/Ionization Time-Of-Flight) mass spectrometry and the use thereof.Type: ApplicationFiled: June 18, 2015Publication date: December 12, 2019Inventors: Bong-Jin MOON, Han-Bin OH, Na-Na KANG, Ae-Ran JEON, Kye-Shin PARK, Je-Hyun BAEK
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Publication number: 20170369934Abstract: Disclosed is a method of designing a valid primer pair satisfying a specificity condition. The method includes searching for an identifier of a base sequence from a genetic information index based on a query language associated with a gene, searching for a candidate primer from a provided candidate primer set index to satisfy the specificity condition based on the identifier of the base sequence, filtering the candidate primer based on primer-related filtering conditions, and providing information about a primer pair satisfying the query language and the filtering conditions based on a result of the filtering.Type: ApplicationFiled: April 26, 2017Publication date: December 28, 2017Applicant: Daegu Gyeongbuk Institute of Science and TechnologyInventors: Min Soo Kim, HYERIN KIM, JAEHYUNG KOO, Na Na Kang, KyuHyeon An
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Patent number: 9725550Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.Type: GrantFiled: December 8, 2015Date of Patent: August 8, 2017Assignees: Samsung Display Co., Ltd., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATIONInventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
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Publication number: 20160306915Abstract: A method for designing all coverage of valid primer pairs, which satisfy various filtering constraints provided by users with respect to a given sequence database and has validated specificity to given sequences, is provided. By screening all suitable primer pairs present on a given DNA sequence database without omitting any one primer pair and also screening all primers having a coverage of 1 or more as well as primers having a coverage of 1, a user can be allowed to give rankings to the primers in order to easily select the primers having a high success rate in biological experiments from the resulting primers.Type: ApplicationFiled: August 12, 2015Publication date: October 20, 2016Inventors: Min Soo KIM, Jae Hyung Koo, Hye Rin Kim, Na Na Kang, Kang Wook Chon, Seon Ho Kim
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Patent number: 9354522Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.Type: GrantFiled: August 22, 2014Date of Patent: May 31, 2016Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Min Hyuck Kang, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
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Publication number: 20160090435Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.Type: ApplicationFiled: December 8, 2015Publication date: March 31, 2016Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH
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Patent number: 9255170Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.Type: GrantFiled: November 21, 2013Date of Patent: February 9, 2016Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATIONInventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
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Publication number: 20150218300Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.Type: ApplicationFiled: August 22, 2014Publication date: August 6, 2015Inventors: MIN HYUCK KANG, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
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Publication number: 20140197132Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.Type: ApplicationFiled: November 21, 2013Publication date: July 17, 2014Applicants: Samsung Display Co., Ltd., Sogang University Research Foundation, KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATIONInventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH