Patents by Inventor Nancy G. Heimann

Nancy G. Heimann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for treating a conductive surface and products formed thereby
    Patent number: 6911139
    Abstract: The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a silicate containing coating or film upon a metallic or conductive surface.
    Type: Grant
    Filed: August 2, 2002
    Date of Patent: June 28, 2005
    Assignee: Elisha Holding LLC
    Inventors: Robert L. Heimann, Branko Popov, Bruce Flint, Nancy G. Heimann, Ravi Chandran, William M. Dalton
  • Method for preparing and using silicate systems to treat electrically conductive surfaces and products obtained therefrom
    Publication number: 20040222105
    Abstract: The disclosure relates to treating a silicate medium and using the treated medium for improving the surface of metallic or electrically conductive materials. The treated medium provides a silicate medium having a defined degree of polymerization and predetermined quantities of the desired silicate polymer. The treated silicate medium can be employed in an electroless or electrolytic process.
    Type: Application
    Filed: April 23, 2004
    Publication date: November 11, 2004
    Inventors: Robert L. Heimann, Wayne L. Soucie, Jonathan L. Bass, Ravi Chandran, Nancy G. Heimann
  • Testing methods for silica containing films and layers
    Publication number: 20040208986
    Abstract: The disclosure relates to methods for ascertaining the corrosion resistant effectiveness of a silica containing film or layer upon a metal surface. The disclosed methods employ colormetric as well as chemical leaching processes. The effectiveness of the silica containing film or layer is dependent upon the uniformity, lack of porosity, micro-cracks, among other potential defects in the silica containing film or layer that affect the ability of the film or layer to protect an underlying metal surface from corrosive environments.
    Type: Application
    Filed: March 12, 2004
    Publication date: October 21, 2004
    Inventors: Bruce Wayne Flint, Robert L. Heimann, Nancy G. Heimann, Brian Patrick Skrabal, Wayne L. Soucie, Dennis Joseph Winn
  • Process for treating a conductive surface and products formed thereby
    Publication number: 20030209290
    Abstract: The disclosure relates to a process for forming a deposit on the surface of a metallic or conductive surface. The process employs an electrolytic process to deposit a silicate containing coating or film upon a metallic or conductive surface.
    Type: Application
    Filed: August 2, 2002
    Publication date: November 13, 2003
    Inventors: Robert L. Heimann, Branko Popov, Bruce flint, Nancy G. Heimann, Ravi Chandran, William M. Dalton