Patents by Inventor Nancy T. Ilaya

Nancy T. Ilaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cosmetic use of N-heteroarylbisamide analogs and related compounds
    Patent number: 9545367
    Abstract: Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: January 17, 2017
    Assignee: AVON PRODUCTS, INC.
    Inventors: Satish Parimoo, Nancy T. Ilaya, John W. Lyga
  • Cosmetic Use of N-Heteroarylbisamide Analogs and Related Compounds
    Publication number: 20150231049
    Abstract: Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
    Type: Application
    Filed: April 30, 2015
    Publication date: August 20, 2015
    Inventors: Satish Parimoo, Nancy T. Ilaya, John W. Lyga
  • Cosmetic use of N-heteroarylbisamide analogs and related compounds
    Patent number: 9044408
    Abstract: Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
    Type: Grant
    Filed: October 31, 2011
    Date of Patent: June 2, 2015
    Assignee: Avon Products, Inc.
    Inventors: Satish Parimoo, Nancy T. Ilaya, John W. Lyga
  • Cosmetic Use of N-Heteroarybisamide Analogs and Related Compounds
    Publication number: 20130109691
    Abstract: Cosmetic and dermatological compositions comprising N-heteroarylbisamide analogs and methods of using such compositions to impart anti-aging benefits to the skin and/or improve skin conditions resulting from reduced collagen and hyaluronic acid production are disclosed. The N-heteroarylbisamides are believed to stimulate collagen and hyaluronic acid production and restore or maintain homeostasis for these compounds.
    Type: Application
    Filed: October 31, 2011
    Publication date: May 2, 2013
    Applicant: AVON PRODUCTS, INC.
    Inventors: Satish Parimoo, Nancy T. Ilaya, John W. Lyga