Patents by Inventor NANDAN U UKIDWE

NANDAN U UKIDWE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11220562
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: January 11, 2022
    Assignee: Solutia Inc.
    Inventor: Nandan U Ukidwe
  • Patent number: 10717862
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties and lower VOC levels as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: July 21, 2020
    Assignee: Solutia Inc.
    Inventors: Nandan U. Ukidwe, Glenn Lewis Shoaf
  • Publication number: 20200017674
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties and lower VOC levels as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Application
    Filed: July 11, 2018
    Publication date: January 16, 2020
    Applicant: Solutia Inc.
    Inventors: Nandan U. Ukidwe, Glenn Lewis Shoaf
  • Publication number: 20190106514
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Application
    Filed: October 10, 2017
    Publication date: April 11, 2019
    Applicant: SOLUTIA INC.
    Inventor: NANDAN U. UKIDWE
  • Publication number: 20190105880
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Application
    Filed: October 10, 2017
    Publication date: April 11, 2019
    Applicant: SOLUTIA INC.
    Inventors: NANDAN U UKIDWE, ARISTOTELIS KARAGIANNIS, PU ZHANG, YINONG MA
  • Publication number: 20190106561
    Abstract: Resin compositions, layers, and interlayers comprising a poly(vinyl acetal) resin that includes residues of an aldehyde other than n-butyraldehyde are provided. Such compositions, layers, and interlayers can exhibit enhanced or optimized properties as compared to those formulated with comparable poly(vinyl n-butyral) resins.
    Type: Application
    Filed: October 10, 2017
    Publication date: April 11, 2019
    Applicant: SOLUTIA INC.
    Inventor: NANDAN U. UKIDWE