Abstract: Multicolor, stacked detector devices, focal plane arrays including multicolor, stacked detector devices, and methods of fabricating the same are disclosed. In one embodiment, a stacked multicolor detector device includes a first detector and a second detector. The first detector includes a first detector structure and a first ground plane adjacent the first detector structure. The second detector includes a second detector structure and a second ground plane adjacent the second detector structure. At least one of the first ground plane and the second ground plane is transmissive to radiation in a predetermined spectral band. The first detector and the second detector are in a stacked relationship.

Abstract: Methods of fabricating multicolor, stacked detector devices and focal plane arrays are disclosed. In one embodiment, a method of fabricating a stacked multicolor device includes forming a first detector by depositing a first detector structure on a first detector substrate, and depositing a first ground plane on the first detector structure, wherein the first ground plane is transmissive to radiation in a predetermined spectral band. The method further includes bonding an optical carrier wafer to the first ground plane, removing the first detector substrate, and forming a second detector. The second detector is formed by depositing a second detector structure on a second detector substrate, and depositing a second ground plane on the second detector structure. The method further includes depositing a dielectric layer on one of the first detector structure and the second ground plane, bonding the first detector to the second detector, and removing the second detector substrate.

Abstract: Multicolor, stacked detector devices, focal plane arrays including multicolor, stacked detector devices, and methods of fabricating the same are disclosed. In one embodiment, a stacked multicolor detector device includes a first detector and a second detector. The first detector includes a first detector structure and a first ground plane adjacent the first detector structure. The second detector includes a second detector structure and a second ground plane adjacent the second detector structure. At least one of the first ground plane and the second ground plane is transmissive to radiation in a predetermined spectral band. The first detector and the second detector are in a stacked relationship.

Abstract: Methods of fabricating multicolor, stacked detector devices and focal plane arrays are disclosed. In one embodiment, a method of fabricating a stacked multicolor device includes forming a first detector by depositing a first detector structure on a first detector substrate, and depositing a first ground plane on the first detector structure, wherein the first ground plane is transmissive to radiation in a predetermined spectral band. The method further includes bonding an optical carrier wafer to the first ground plane, removing the first detector substrate, and forming a second detector. The second detector is formed by depositing a second detector structure on a second detector substrate, and depositing a second ground plane on the second detector structure. The method further includes depositing a dielectric layer on one of the first detector structure and the second ground plane, bonding the first detector to the second detector, and removing the second detector substrate.

Abstract: Embodiments disclosed herein relate to a ROIC with a plurality of unit cells coupled to a detector array having a plurality of detectors for collecting photoelectrons over a plurality of temporal instances. An individual unit cell is electrically coupled to an individual detector to have one-to-one correspondence and includes one or more storage elements coupled to one or more programmable logic control switches. The storage element(s) store signal charges representing the photoelectrons while the programmable logic control switch(es) direct the signal charges from the storage element(s) at an individual temporal instance. A configuration of signal charges in the plurality of unit cells is mathematically operated as a three-dimensional matrix having a plurality of elements, where the three dimensions correspond to the two spatial dimensions of an individual unit cell and the individual temporal instance, and an individual element has a value corresponding to the number of signal charges stored therein.

Abstract: Embodiments disclosed herein relate to a ROIC with a plurality of unit cells coupled to a detector array having a plurality of detectors for collecting photoelectrons over a plurality of temporal instances. An individual unit cell is electrically coupled to an individual detector to have one-to-one correspondence and includes one or more storage elements coupled to one or more programmable logic control switches. The storage element(s) store signal charges representing the photoelectrons while the programmable logic control switch(es) direct the signal charges from the storage element(s) at an individual temporal instance. A configuration of signal charges in the plurality of unit cells is mathematically operated as a three-dimensional matrix having a plurality of elements, where the three dimensions correspond to the two spatial dimensions of an individual unit cell and the individual temporal instance, and an individual element has a value corresponding to the number of signal charges stored therein.

Abstract: Systems and methods for characterizing an obscurant and imaging a target are disclosed. In one embodiment, a method of imaging a target includes characterizing at least one obscurant present in an environment, and determining, based on the at least one characterized obscurant, one or more of the following: one or more wavelengths corresponding to the at least one obscurant, a polarization state corresponding to the at least one obscurant, and a sensor exposure time corresponding to the at least one obscurant. The method further includes adjusting one or more parameters of an imagining system based at least in part on a characterization of the at least one obscurant.

Abstract: Systems and methods for characterizing an obscurant and imaging a target are disclosed. In one embodiment, a method of imaging a target includes characterizing at least one obscurant present in an environment, and determining, based on the at least one characterized obscurant, one or more of the following: one or more wavelengths corresponding to the at least one obscurant, a polarization state corresponding to the at least one obscurant, and a sensor exposure time corresponding to the at least one obscurant. The method further includes adjusting one or more parameters of an imagining system based at least in part on a characterization of the at least one obscurant.

Abstract: Systems and methods for characterizing an obscurant and imaging a target are disclosed. In one embodiment, a method of imaging a target includes characterizing at least one obscurant present in an environment, and determining, based on the at least one characterized obscurant, one or more of the following: one or more wavelengths corresponding to the at least one obscurant, a polarization state corresponding to the at least one obscurant, and a sensor exposure time corresponding to the at least one obscurant. The method further includes adjusting one or more parameters of an imagining system based at least in part on a characterization of the at least one obscurant.

Abstract: Systems and methods for characterizing an obscurant and imaging a target are disclosed. In one embodiment, a method of imaging a target includes characterizing at least one obscurant present in an environment, and determining, based on the at least one characterized obscurant, one or more of the following: one or more wavelengths corresponding to the at least one obscurant, a polarization state corresponding to the at least one obscurant, and a sensor exposure time corresponding to the at least one obscurant. The method further includes adjusting one or more parameters of an imagining system based at least in part on a characterization of the at least one obscurant.

Abstract: The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.

Abstract: An illumination system includes optics capable of adjusting the size of a beam of light and adjusting the focus of the beam of light. Spot size control optics adjusts the overall size of the beam of light and separately adjusts the ellipticity of the beam, primarily in one dimension. Light from the spot size control optics passes to focus control optics that control the overall focus of the beam of light and adjust the astigmatism of the beam by altering the focus position of the beam of light in one dimension. The laser system, the spot size control optics and the focus control optics are within an enclosure. Actuators under remote control from outside of the enclosure adjust both of the spot size control optics and focus control optics in the thermal environment of the illumination system.

Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for making three-dimensional objects on a layer by layer basis by selectively exposing layers of material to prescribed stimulation, using a beam having a first smaller diameter and a beam having a second larger diameter, to form laminae of the object. The power of the smaller beam is typically lower than the power of the larger beam. Object formation is controlled by data representing portions of the layers to be exposed with the larger beam (large spot portions) and those portions to be exposed with the smaller beam (small spot portions). In a preferred embodiment, portions exposed with the larger beam are formed first, for a given layer. Portions are exposed with the small beam next. Thereafter the entire perimeter of the laminae is traced using the small beam.

Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.

Abstract: A rapid prototyping and manufacturing (e.g. stereolithography) method and apparatus for producing three-dimensional objects by selectively subjecting a liquid or other fluid-like material to a beam of prescribed stimulation. In a preferred embodiment a source of prescribed stimulation is controlled to reduce or inhibit the production of the prescribed stimulation during at least some periods when the prescribed stimulation is not needed to expose the material. In another preferred embodiment, the source of stimulation is controlled to vary the quantity of prescribed stimulation that is produced and allowed to reach the material. In an additional preferred embodiment, control of laser output occurs based on a combination of supplying a regulated amount of voltage to an AOM in conjunction with temporary sensing of laser power and a known desired power to attain.