Patents by Inventor Nanwen ZHU

Nanwen ZHU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12251680
    Abstract: Provided are a hierarchical porous defect UiO-66 material and a preparation method thereof. The method includes the following steps: mixing a zirconium ion source, a mixed ligand, an organic acid, an organic good solvent, and water to obtain a mixture; and subjecting the mixture to reaction while heating, washing, freeze-drying, and heat treatment in sequence to obtain the hierarchical porous defect UiO-66 material; where hierarchical pores of the hierarchical porous defect UiO-66 material comprise micropores and mesopores; the micropores each have a pore size of not greater than 2 nm; the mesopores each have a pore size of 2 nm to 4 nm; the mixed ligand includes terephthalic acid and a trisubstituted benzene series; and the trisubstituted benzene series is one or two selected from the group consisting of 2-aminoterephthalic acid and 2-aminoisophthalic acid.
    Type: Grant
    Filed: April 20, 2024
    Date of Patent: March 18, 2025
    Assignee: SHANGHAI JIAO TONG UNIVERSITY
    Inventors: Jinming Luo, Chunyu Lv, Yitao Pan, Nanwen Zhu
  • Publication number: 20240424476
    Abstract: Provided are a hierarchical porous defect UiO-66 material and a preparation method thereof. The method includes the following steps: mixing a zirconium ion source, a mixed ligand, an organic acid, an organic good solvent, and water to obtain a mixture; and subjecting the mixture to reaction while heating, washing, freeze-drying, and heat treatment in sequence to obtain the hierarchical porous defect UiO-66 material; where hierarchical pores of the hierarchical porous defect UiO-66 material comprise micropores and mesopores; the micropores each have a pore size of not greater than 2 nm; the mesopores each have a pore size of 2 nm to 4 nm; the mixed ligand includes terephthalic acid and a trisubstituted benzene series; and the trisubstituted benzene series is one or two selected from the group consisting of 2-aminoterephthalic acid and 2-aminoisophthalic acid.
    Type: Application
    Filed: April 20, 2024
    Publication date: December 26, 2024
    Inventors: Jinming LUO, Chunyu LV, Yitao PAN, Nanwen ZHU