Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

Abstract: A laminate includes a substrate; an atomic layer deposition film that is disposed on at least one surface of the substrate, and is made of an inorganic material; and a protective film that is bonded to and covers the atomic layer deposition film, and has an adhesive layer that is in contact with the atomic layer deposition film.

Abstract: A laminate includes a base having a surface; an atomic layer deposition film that covers the surface of the base and has a film thickness of about 3 nm to about 500 nm (inclusive); and an overcoat layer that covers the atomic layer deposition film. A relationship of ta<toc<50 ta is met, where ta denotes the thickness of the atomic layer deposition film and toc denotes the thickness of the overcoat layer.

Abstract: A laminate (10) includes: a first substrate (11); an atomic layer deposition film (12) that is an inorganic oxide layer disposed on a first surface (11a) of the first substrate; a second substrate (14) disposed on one surface of the atomic layer deposition film; and a first adhesive layer (13) disposed between the atomic layer deposition film and the second substrate for adhering the atomic layer deposition film to the second substrate.

Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

Abstract: A laminate (10) includes: a first substrate (11); an atomic layer deposition film (12) that is an inorganic oxide layer disposed on a first surface (11a) of the first substrate; a second substrate (14) disposed on one surface of the atomic layer deposition film; and a first adhesive layer (13) disposed between the atomic layer deposition film and the second substrate for adhering the atomic layer deposition film to the second substrate.

Abstract: A laminate includes a substrate; an atomic layer deposition film that is disposed on at least one surface of the substrate, and is made of an inorganic material; and a protective film that is bonded to and covers the atomic layer deposition film, and has an adhesive layer that is in contact with the atomic layer deposition film.

Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

Abstract: A laminate (10) includes: a first substrate (11); an atomic layer deposition film (12) that is an inorganic oxide layer disposed on a first surface (11a) of the first substrate; a second substrate (14) disposed on one surface of the atomic layer deposition film; and a first adhesive layer (13) disposed between the atomic layer deposition film and the second substrate for adhering the atomic layer deposition film to the second substrate.

Abstract: A laminate includes a base having a surface; an atomic layer deposition film that covers the surface of the base and has a film thickness of about 3 nm to about 500 nm (inclusive); and an overcoat layer that covers the atomic layer deposition film. A relationship of ta<toc<50 ta is met, where ta denotes the thickness of the atomic layer deposition film and toc denotes the thickness of the overcoat layer.