Patents by Inventor Naohiko Sugimoto
Naohiko Sugimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 4897306Abstract: An improvement of a medium for electrophoresis which comprises a support of a plastic material and an aqueous polyacrylamide gel, wherein a resin layer comprises a resin having an oxygen permeability coefficient lower than that of the plastic material of the support is arranged betwen the support and the polyacrylamide gel. The resin preferably shows an oxygen permeability of not more than 15 cc/m.sup.2 .multidot.atm.multidot.day in the form of a resinous layer of 20 .mu.m thick, and exemplified by a vinylidene chloride-vinyl chloride copolymer, polyvinyl alcohol, polyacrylonitrile, polyvinylidene chloride, a vinyl alcohol-ethylene copolymer, a vinylidene chloride-acrylonitrile copolymer, and an acrylonitrile-methyl acrylate-butadiene copolymer.Type: GrantFiled: April 20, 1987Date of Patent: January 30, 1990Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Daijiro Nishio, Elichi Hasegawa
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Patent number: 4883577Abstract: An electrophoresis device comprises a gel membrane disposed within a space formed by a pair of sheets and a pair of spacers. A shark's teeth comb is disposed at an end of the gel membrane such that a plurality of triangular sample-pouring apertures are formed by its saw-like protrusions and the end of the gel membrane. The thickness of the shark's teeth comb d and the thickness of the gel membrane G satisfy the following relation:Gx1.1<d<G+50in which unit is .mu.m.Type: GrantFiled: March 28, 1988Date of Patent: November 28, 1989Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Akira Fujita
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Patent number: 4718998Abstract: An element for electrophoresis suitably employable for analysis of biopolymers such as proteins, as well as for determination of base sequence of DNA, RNA, their fragments, and their derivatives, which comprises a plastic film, a layer for electrophoresis comprising an aqueous polyacrylamide gel, an adhesive layer containing gelatin and optionally a film-forming polymer and/or fine particles, and a plastic film.Type: GrantFiled: May 19, 1987Date of Patent: January 12, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Masashi Ogawa, Naohiko Sugimoto
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Patent number: 4695354Abstract: In a medium for electrophoresis suitably employable for determination of base sequence of DNA, RNA, their fragments, and their derivatives, which comprises an aqueous polyacrylamide gel formed by crosslinking polymerization of an acrylamide compound and a crosslinking agent in the presence of water and at least one compound having a carbamoyl group, the improvement wherein glycerol is contained in the medium in a small amount ranging from 0.1 to 1.0 wt/v %.Type: GrantFiled: September 17, 1986Date of Patent: September 22, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Mitsuru Sugihara, Naohiko Sugimoto
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Patent number: 4677050Abstract: A silver halide photographic material is described, comprising a support having thereon at least one layer containing a cross-linked polymer represented by formula (I) ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or an unsubstituted or substituted alkyl group; R.sub.3 represents a hydrogen atom, an unsubstituted or substituted alkyl group, cycloalkyl group, aryl group, or acyl group; R.sub.4 represents a hydrogen atom or an unsubstituted or substituted alkyl group; or R.sub.3 and R.sub.Type: GrantFiled: September 4, 1986Date of Patent: June 30, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Shigeki Yokoyama, Takayuki Inayama, Naohiko Sugimoto, Takashi Naoi
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Patent number: 4675278Abstract: In silver halide photographic light-sensitive materials comprising at least one silver halide photographic emulsion layer on one side of a base and an emulsion protective layer thereon, and a hydrophilic colloid backing layer on the other side of the base, the improvement wherein said backing layer contains a polymer matting agent having an average particle size of 3.0 .mu.m or more and said emulsion protective layer contains at least one of a polyoxyethylene type surface active agent, and a silicone type slipping agent.Type: GrantFiled: October 10, 1986Date of Patent: June 23, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Kunio Ishigaki
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Patent number: 4645735Abstract: A silver halide photographic light-sensitive material is disclosed. The material is comprised of a support base having positioned thereon a light-sensitive silver halide emulsion layer, a light-insensitive layer and ultraviolet ray absorbing polymer latex of a polymer having a repeating unit derived from a monomer represented by the general formula (I): ##STR1## within general formula (I) the substituents are defined within the specification. The Q represents an ultraviolet ray absorbing group represented by a general formula (II) or (III): ##STR2## The substituents within the general formulae given above are defined in the specification. By including the particular ultraviolet ray absorbing polymer latex of the invention the resulting photographic material has improved antistatic properties and the photographic characteristics of the material are not deteriorated by the presence of the latex.Type: GrantFiled: March 13, 1985Date of Patent: February 24, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Tetsuro Kojima, Shingo Ishimaru
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Patent number: 4551420Abstract: A silver halide photographic light-sensitive material is disclosed which is comprised of a support base having thereon a light-sensitive silver halide emulsion layer and a light-insensitive layer. The material also includes an ultraviolet ray absorbing polymer latex and a fine grained silver halide having a diameter of 0.2 microns or less. The ultraviolet ray absorbing polymer latex is a polymer or copolymer having a repeating unit derived from a monomer represented by the general formula (I): ##STR1## the substituents are defined within the specification. By utilizing the polymer latex of general formula (I) the occurance of static marks is almost completely prevented without causing undesirable effects on other film properties.Type: GrantFiled: February 1, 1985Date of Patent: November 5, 1985Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Tetsuro Kojima
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Patent number: 4474873Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer wherein the photographic light-sensitive material contains a compound represented by the following general formula (I): ##STR1## wherein Rf represents a saturated or unsaturated hydrocarbon group having from 3 to 20 carbon atoms wherein all or a part of the hydrogen atoms are substituted with fluorine atoms; A and B each represents a divalent linking group; R.sub.1 represents a hydrogen atom or an alkyl group; R.sub.2, R.sub.3 and R.sub.4 each represents an alkyl group and at least one of R.sub.1, R.sub.2, R.sub.3 and R.sub.4 represents an alkyl group substituted with a monovalent group, and X represents an anion.Type: GrantFiled: May 18, 1983Date of Patent: October 2, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Yukio Maekawa, Yasuo Mukunoki, Naohiko Sugimoto
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Patent number: 4464462Abstract: A silver halide photographic light-sensitive material having improved antistatic properties is disclosed. The material is comprised of a support having thereon a light-senstive silver halide emulsion layer and a light-insensitive layer. The material includes (A) a flourine containing cationic surface active agent and (B) an ultraviolet ray absorbing polymer latex which comprises a polymer or a copolymer having a repeating unit derived from a monomer represented by the following general formula (I): ##STR1## within the formula (I) the Q is an ultraviolet ray absorbing group represented by the following general formula (II) or (III): ##STR2## the substituents within the formulae shown are defined within the specification. The ultraviolet ray absorbing polymer latex is present in the material in an amount in the range of 10 to 2,000 mg/m.sup.2 of the material.Type: GrantFiled: July 29, 1983Date of Patent: August 7, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Tetsuro Kojima, Yasuo Mukunoki
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Patent number: 4455368Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion and at least one light-insensitive layer is disclosed. One or more of the layers of the material contains an ultraviolet ray absorbing polymer latex which comprises a homopolymer or copolymer having a repeating unit derived from a monomer represented by the general formula (II) in which one or more ultraviolet ray absorbing compounds represented by the general formula (I) is loaded: ##STR1## the substituents within the general formula are defined within the specification. The material has excellent absorption characteristics in the 300 to 400 nm range and does not cause static marks caused by ultraviolet rays or undergo deterioration of color reproduction. In addition, the material has good film strength and reduced layer thickness and provides a color image having improved sharpness which is free from fading or discoloration due to light.Type: GrantFiled: April 14, 1983Date of Patent: June 19, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Tetsuro Kojima, Shingo Ishimaru, Naohiko Sugimoto, Tadashi Ikeda
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Patent number: 4443534Abstract: A silver halide photographic light-sensitive material is disclosed. The material is comprised of a support having thereon a light-sensitive silver halide layer and a light-insensitive layer. The material may also contain other layers and one or more layers contains an ultraviolet ray absorbing polymer latex. The polymer latex is comprised of a homopolymer or a copolymer having a repeating unit derived from a monomer represented by the following general formula (I): ##STR1## within the general formula (I) the Q represents an ultraviolet ray absorbing group represented by the general formula (II): ##STR2## the substituents within the general formulae (I) and (II) are defined in a specification. The photographic light-sensitive material has excellent absorbing characteristic in the 300 to 400 nm range and does not cause static marks caused by ultraviolet layer. Furthermore, the material does not undergo discoloration.Type: GrantFiled: April 12, 1983Date of Patent: April 17, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Tetsuro Kojima, Shingo Ishimaru, Naohiko Sugimoto, Tadashi Ikeda
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Patent number: 4431726Abstract: A silver halide photographic light-sensitive material is disclosed. The material is comprised of one or more light-sensitive silver emulsion layers and one or more light-insensitive layers. The silver halide layers or light-insensitive layers contain an ultraviolet ray absorbing polymer latex. The polymer latex is comprised of a homopolymer or copolymer having a repeating unit derived from monomers represented by the following general formula (I): ##STR1## wherein the substituents within a general formula (I) are defined within the specification. The polymer latex (I) contains a substituents Q which represents an ultraviolet ray absorbing group represented by the general formula (II): ##STR2## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.Type: GrantFiled: December 27, 1982Date of Patent: February 14, 1984Assignee: Fuji Photo Film Co., Ltd.Inventors: Tetsuro Kojima, Tadashi Ikeda, Shingo Ishimaru, Naohiko Sugimoto
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Patent number: 4407937Abstract: A silver halide photographic sensitive material is described comprising a compound represented by formula (I) ##STR1## wherein Rf represents a saturated or unsaturated hydrocarbon group having from 3 to 20 carbon atoms wherein all or a part of the hydrogen atoms are substituted by fluorine atoms, each of L.sub.1 and L.sub.2 represents a divalent linking group, each of R.sub.1, R.sub.2, and R.sub.3 represents a hydrogen atom, a methyl group, or an ethyl group, each of R.sub.4, R.sub.5, and R.sub.6 represents an alkyl group having from 1 to 6 carbon atoms, X represents an anion, and each of a and b represents 0, 1, or 2.Type: GrantFiled: March 4, 1982Date of Patent: October 4, 1983Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Yukio Maekawa, Yasunori Ichikawa
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Patent number: 4304852Abstract: A silver halide photographic light-sensitive material is described containinga film-forming water-soluble polymer derived from a monomer including a carboxylic acid group;a compound of the formula (I) ##STR1## wherein A is ##STR2## or a chemical bond; R is a saturated or unsaturated hydrocarbon group having from 8 to 22 carbon atoms when A is a chemical bond, and a saturated or unsaturated hydrocarbon group having from 7 to 21 carbon atoms whenA is ##STR3## R.sub.5 is hydrogen, a methyl group, or an ethyl group; B is --COO.sup..crclbar. or --SO.sub.3.sup..crclbar. ; R.sub.1 and R.sub.2 are each an alkyl group or hydroxyalkyl group having from 1 to 18 carbon atoms, or a polyalkylene oxide chain group; R.sub.3 and R.sub.4 are each hydrogen or an alkyl group having from 1 to 4 carbon atoms; n is an integer of from 2 to 8; and x is 0 or 1; anda compound of the formula (II) ##STR4## wherein A, B, R.sub.1, R.sub.2, R.sub.3, R.sub.Type: GrantFiled: September 19, 1980Date of Patent: December 8, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Shinzo Kishimoto, Katsumi Ryoke, Masakazu Yoneyama, Nobuhisa Sekiguchi
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Patent number: 4268623Abstract: A photographic light-sensitive material having an antistatic layer containing a water-soluble, film-forming polymer having a carboxylic acid group and gelatin, said layer further containing a carboxylic acid activating condensing agent.Type: GrantFiled: January 11, 1980Date of Patent: May 19, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Hidefumi Sera, Kiyotaka Hori, Naohiko Sugimoto
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Patent number: 4267265Abstract: A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a surface layer thereof containing an organic fluoro-compound and a carboxy group-containing compound, resulting in an improvement in the physical characteristics of the surface.Type: GrantFiled: December 29, 1978Date of Patent: May 12, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Naohiko Sugimoto, Ikutaro Horie, Kameji Nagao, Masakazu Yoneyama, Yasuhiro Nakayama, Nobuo Yamamoto
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Patent number: 3938999Abstract: An antistatic photographic sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein a surface active copolymer containing in the main chain a repeating unit represented by the formula (I) ##EQU1## wherein Y represents an organic residue having 4 to 22 carbon atoms; n represents the average number of ethyleneoxy units and is 1 to 100; and M represents a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, an ammonium group or an alkylammonium group is present in at least one of a surface of the support and a photographic layer.Type: GrantFiled: March 31, 1975Date of Patent: February 17, 1976Assignee: Fuji Photo Film Co., Ltd.Inventors: Masakazu Yoneyama, Nobuo Yamamoto, Naohiko Sugimoto, Ikutaro Horie, Yasuhiro Nakayama