Patents by Inventor Naohiro NISHIDA

Naohiro NISHIDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adhesive preparation containing bisoprolol
    Patent number: 10717904
    Abstract: An adhesive preparation containing bisoprolol includes a backing and a pressure-sensitive adhesive layer formed on one side of the backing. The pressure-sensitive adhesive layer contains a polymer prepared through copolymerization of monomer components including a hydroxyl group-containing monomer and an alkyl (meth)acrylate monomer (component (A)), a polymer prepared through copolymerization of monomer components including a methyl methacrylate monomer and a butyl methacrylate monomer (component (B)), and bisoprolol (component (C)).
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: July 21, 2020
    Assignee: TOA EIYO LTD.
    Inventors: Eriko Abe, Yu Tachikawa, Satoshi Ameyama, Naoko Urushihara, Jun Ishikura, Tetsuya Nakamura, Akira Yokouchi, Yoshitaka Inoue, Kazuhiro Aoyagi, Tomoya Tanaka, Naohiro Nishida, Kunihiro Minami
  • ADHESIVE PREPARATION CONTAINING BISOPROLOL
    Publication number: 20180194977
    Abstract: An adhesive preparation containing bisoprolol includes a backing and a pressure-sensitive adhesive layer formed on one side of the backing. The pressure-sensitive adhesive layer contains a polymer prepared through copolymerization of monomer components including a hydroxyl group-containing monomer and an alkyl (meth)acrylate monomer (component (A)), a polymer prepared through copolymerization of monomer components including a methyl methacrylate monomer and a butyl methacrylate monomer (component (B)), and bisoprolol (component (C)).
    Type: Application
    Filed: June 17, 2016
    Publication date: July 12, 2018
    Applicant: TOA EIYO LTD.
    Inventors: Eriko ABE, Yu TACHIKAWA, Satoshi AMEYAMA, Naoko URUSHIHARA, Jun ISHIKURA, Tetsuya NAKAMURA, Akira YOKOUCHI, Yoshitaka INOUE, Kazuhiro AOYAGI, Tomoya TANAKA, Naohiro NISHIDA, Kunihiro MINAMI