Abstract: A processing apparatus includes a processor. The processor acquires an image in which region marker information of a lesion is set with respect to an ultrasonic image of an ultrasonic endoscope with a biopsy needle, and calculates an angle of the biopsy needle for inserting the biopsy needle into the lesion based on a movable range of the biopsy needle and the region marker information.

Abstract: A semiconductor device includes a first semiconductor layer, a second semiconductor layer, a first pad, and a second pad. A first opening and a second opening are formed in a first main surface of the first semiconductor layer. The second semiconductor layer is stacked on the first semiconductor layer. The first pad for wire bonding is disposed in the first opening. The second pad on which an alignment mark is formed is disposed in the second opening. A third opening and a fourth opening penetrate the second semiconductor layer. The first opening overlaps the third opening. The second opening overlaps the fourth opening.

Abstract: A semiconductor device includes a first semiconductor layer, a second semiconductor layer, a first pad, and a second pad. A first opening and a second opening are formed in a first main surface of the first semiconductor layer. The second semiconductor layer is stacked on the first semiconductor layer. The first pad for wire bonding is disposed in the first opening. The second pad on which an alignment mark is formed is disposed in the second opening. A third opening and a fourth opening penetrate the second semiconductor layer. The first opening overlaps the third opening. The second opening overlaps the fourth opening.

Abstract: A semiconductor device includes a first semiconductor layer, a second semiconductor layer, a first pad, and a second pad. A first opening and a second opening are formed in a first main surface of the first semiconductor layer. The second semiconductor layer is stacked on the first semiconductor layer. The first pad for wire bonding is disposed in the first opening. The second pad on which an alignment mark is formed is disposed in the second opening. A third opening and a fourth opening penetrate the second semiconductor layer. The first opening overlaps the third opening. The second opening overlaps the fourth opening.

Abstract: A semiconductor device includes a first semiconductor substrate, a second semiconductor substrate, a bonding electrode, and a dummy electrode. The first semiconductor substrate has a first surface and a first wiring, and contains a first semiconductor material. The second semiconductor substrate has a second surface and a second wiring, and contains a second semiconductor material, and the first surface and the second surface face each other. The bonding electrode is arranged between the first surface and the second surface, and is electrically connected to the first wiring and the second wiring. The dummy electrode is arranged between the first surface and the second surface, and is electrically insulated from at least one of the first wiring and the second wiring. The bonding electrode has a bonding bump and a first bonding pad. The dummy electrode has a dummy bump and a first dummy pad.

Abstract: A semiconductor device includes a first substrate, a second substrate, a first pad, a second pad, a first micro-bump, a first resin layer, and an insulating layer. The first substrate has a first semiconductor layer and a first wire layer. The second substrate has a second semiconductor layer and a second wire layer. The insulating layer contains an insulating material having hygroscopic properties lower than hygroscopic properties of the first resin layer. The insulating layer penetrates the second substrate and the first resin layer. The insulating layer surrounds the first micro-bump in a first cross section which passes through the first micro-bump, the first resin layer, and the insulating layer and is parallel to the first surface.

Abstract: A semiconductor device includes a first semiconductor substrate, a second semiconductor substrate, a bonding electrode, and a dummy electrode. The first semiconductor substrate has a first surface and a first wiring, and contains a first semiconductor material. The second semiconductor substrate has a second surface and a second wiring, and contains a second semiconductor material, and the first surface and the second surface face each other. The bonding electrode is arranged between the first surface and the second surface, and is electrically connected to the first wiring and the second wiring. The dummy electrode is arranged between the first surface and the second surface, and is electrically insulated from at least one of the first wiring and the second wiring. The bonding electrode has a bonding bump and a first bonding pad. The dummy electrode has a dummy bump and a first dummy pad.

Abstract: A semiconductor substrate includes: an alignment mark being formed of a material that reflects a detection light for detecting positions and having a detection edge portion; a light-shielding layer portion having a larger outer shape than the alignment mark, being formed of a material that shields the detection light, and being disposed at a position on a backside of the alignment mark when seen from an incidence side of the detection light; and one or more light-transmitting layer portions being laminated between the alignment mark and the light-shielding layer portion so as to transmit the detection light and not being patterned at least in a range that overlaps the light-shielding layer portion.

Abstract: A solid-state imaging device is a solid-state imaging device in which a first substrate formed on a first semiconductor wafer and a second substrate formed on a second semiconductor wafer are bonded via connect that electrically connects the substrates, wherein the first substrate includes photoelectric conversion units, the second substrate includes an output circuit that acquires a signal generated by the photoelectric conversion unit via the connector and outputs the signal, and dummy connectors that support the first and second bonded substrates are further arranged in a substrate region in which the connectors are not arranged in a substrate region of at least one of the first substrate and the second substrate.

Abstract: A semiconductor device includes a plurality of substrates including a semiconductor layer and a wiring layer, wherein each of the plurality of substrates is separated from and overlap other substrate of the plurality of substrates in a direction crossing a main surface, and the wiring layer of an edge substrate is arranged between the semiconductor layer of the edge substrate and the substrate adjacent to the edge substrate, a connection portion that electrically connects two adjacent substrates among the plurality of substrates, a resin layer that is arranged between the two adjacent substrates among the plurality of substrates, and a first opening portion that is formed in the semiconductor layer of the edge substrate, the shape of the first opening portion viewed in the direction squarely facing the main surface of the edge substrate being a polygon having five or more sides or a circle.

Abstract: A semiconductor substrate includes: an alignment mark being formed of a material that reflects a detection light for detecting positions and having a detection edge portion; a light-shielding layer portion having a larger outer shape than the alignment mark, being formed of a material that shields the detection light, and being disposed at a position on a backside of the alignment mark when seen from an incidence side of the detection light; and one or more light-transmitting layer portions being laminated between the alignment mark and the light-shielding layer portion so as to transmit the detection light and not being patterned at least in a range that overlaps the light-shielding layer portion.

Abstract: A stacked solid-state imaging device includes a first substrate and a second substrate that are stacked on each other, a photoelectric conversion unit that converts incident light into an electrical signal, an electrode portion that is provided on the first substrate and has an exposed surface exposed to the outside in order to deliver an electrical signal to and from the outside, a connection portion that electrically connects a first contact portion provided on the first substrate and a second contact portion provided on the second substrate, and a wiring portion that is provided on the first substrate and electrically connects the electrode portion and the first contact portion in which the connection portion is arranged so as not to overlap the exposed surface when seen from a stacked direction in which the first substrate and the second substrate are stacked on each other.

Abstract: A stacked semiconductor device includes a first substrate and a second substrate. The first electrode is connected to the second electrode so that the first surface faces the second surface. A tip portion of the first wall section that faces the second substrate is connected to a tip portion of the second wall section that faces the first substrate. The first wall section is connected to the second wall section over an entire circumference. An outside space that is formed in an outside of the first wall section and an outside of the second wall section between the first substrate and the second substrate is filled with a sealing member over the entire circumference.

Abstract: A solid-state imaging device is a solid-state imaging device in which a first substrate formed on a first semiconductor wafer and a second substrate formed on a second semiconductor wafer are bonded via connect that electrically connects the substrates, wherein the first substrate includes photoelectric conversion units, the second substrate includes an output circuit that acquires a signal generated by the photoelectric conversion unit via the connector and outputs the signal, and dummy connectors that support the first and second bonded substrates are further arranged in a substrate region in which the connectors are not arranged in a substrate region of at least one of the first substrate and the second substrate.

Abstract: A solid-state imaging device is a solid-state imaging device in which a first substrate formed on a first semiconductor wafer and a second substrate formed on a second semiconductor wafer are bonded via connect that electrically connects the substrates, wherein the first substrate includes photoelectric conversion units, the second substrate includes an output circuit that acquires a signal generated by the photoelectric conversion unit via the connector and outputs the signal, and dummy connectors that support the first and second bonded substrates are further arranged in a substrate region in which the connectors are not arranged in a substrate region of at least one of the first substrate and the second substrate.