Patents by Inventor Naohiro Umeo

Naohiro Umeo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Glass substrate for mask blank, and method for producing the same
    Patent number: 10241392
    Abstract: A glass substrate for a mask blank includes two main surfaces facing each other and surfaces to be chamfered. The surfaces to be chamfered are provided peripherally around the two main surfaces. A flatness of one of the main surfaces is 100 nm or less. On the surface to be chamfered from which substrate corner parts are excluded, each of the substrate corner part being portions where a distance from an outer end of a two-dimensional projection profile of the one of the main surfaces and the surface to be chamfered is within 10 mm, a waviness measured in a range of 2 mm at an arbitrary part in a direction parallel to one side closest to the surface to be chamfered in the two-dimensional projection profile is 50 nm or less.
    Type: Grant
    Filed: January 6, 2016
    Date of Patent: March 26, 2019
    Assignee: AGC Inc.
    Inventors: Yusuke Hirabayashi, Yuzo Okamura, Naohiro Umeo
  • GLASS SUBSTRATE FOR MASK BLANK
    Publication number: 20160266482
    Abstract: A glass substrate for a mask blank includes two main surfaces facing each other, side surfaces and surfaces to be chamfered. The surfaces to be chamfered are provided peripherally around each of the two main surfaces. At least one of the side surfaces and the surfaces to be chamfered in the glass substrate has, in a measurement area with an atomic force microscope (AFM) of 3 ?m square, an arithmetic mean roughness (Ra) of 0.5 nm or less and a dale void volume (Vvv) obtained from a bearing area curve as defined in ISO 25178-2(2012) of 1.5×107 nm3 or less.
    Type: Application
    Filed: February 24, 2016
    Publication date: September 15, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Naohiro UMEO, Yoshiaki IKUTA, Yuzo OKAMURA
  • GLASS SUBSTRATE FOR MASK BLANK, AND METHOD FOR PRODUCING THE SAME
    Publication number: 20160209742
    Abstract: A glass substrate for a mask blank includes two main surfaces facing each other and surfaces to be chamfered. The surfaces to be chamfered are provided peripherally around the two main surfaces. A flatness of one of the main surfaces is 100 nm or less. On the surface to be chamfered from which substrate corner parts are excluded, each of the substrate corner part being portions where a distance from an outer end of a two-dimensional projection profile of the one of the main surfaces and the surface to be chamfered is within 10 mm, a waviness measured in a range of 2 mm at an arbitrary part in a direction parallel to one side closest to the surface to be chamfered in the two-dimensional projection profile is 50 nm or less.
    Type: Application
    Filed: January 6, 2016
    Publication date: July 21, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yusuke Hirabayashi, Yuzo Okamura, Naohiro Umeo