Patents by Inventor Naohisa Goto

Naohisa Goto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7582569
    Abstract: A distributor (30) includes a square waveguide (31) to be connected to a microwave oscillator (20) and a square waveguide (41) having a plurality of openings (43) formed in a narrow wall (41B). The square waveguide (31) is hollow. A wave delaying member (53) having a relative dielectric constant ?r is arranged in the square waveguide (41). Narrow walls (31A, 41A) of the two square waveguides (31, 41) are brought into contact with each other, and a communication hole (32) through which the two waveguides (31, 41) communicate with each other is formed in the narrow walls (31A, 41A). The widths of the two waveguides (31, 41) do not become narrow at their connecting portion even if the width of the communication hole (32) is decreased. Thus, a band of a frequency that can pass through the connecting portion is suppressed from becoming narrow. Consequently, reflection loss that occurs when the frequency of electromagnetic waves to be input to the distributor (30) changes can be decreased.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: September 1, 2009
    Assignees: Tokyo Electron Limited
    Inventors: Tadahiro Ohmi, Naohisa Goto, Nobuhiro Kuga, Akihiko Hiroe
  • Patent number: 7325511
    Abstract: A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: February 5, 2008
    Assignees: Tokyo Electron Limited
    Inventors: Naohisa Goto, Tadahiro Ohmi, Masaki Hirayama, Tetsuya Goto
  • Publication number: 20070133919
    Abstract: A distributor (30) includes a square waveguide (31) to be connected to a microwave oscillator (20) and a square waveguide (41) having a plurality of openings (43) formed in a narrow wall (41B). The square waveguide (31) is hollow. A wave delaying member (53) having a relative dielectric constant ?r is arranged in the square waveguide (41). Narrow walls (31A, 41A) of the two square waveguides (31, 41) are brought into contact with each other, and a communication hole (32) through which the two waveguides (31, 41) communicate with each other is formed in the narrow walls (31A, 41A). The widths of the two waveguides (31, 41) do not become narrow at their connecting portion even if the width of the communication hole (32) is decreased. Thus, a band of a frequency that can pass through the connecting portion is suppressed from becoming narrow. Consequently, reflection loss that occurs when the frequency of electromagnetic waves to be input to the distributor (30) changes can be decreased.
    Type: Application
    Filed: March 10, 2004
    Publication date: June 14, 2007
    Applicants: TOKYO ELECTRON LIMITED
    Inventors: Tadahiro Ohmi, Naohisa Goto, Nobuhiro Kuga, Akihiko Hiroe
  • Publication number: 20070045242
    Abstract: A plasma processing apparatus includes a stage, processing vessel, and microwave supply device. A target object is placed on the stage. The processing vessel accommodates the stage. The microwave supply device supplies microwaves into the processing vessel, and includes a parallel-plate waveguide, a plurality of slots, a square waveguide array, and a distributor. The parallel-plate waveguide includes a first conductive plate which is rectangular when seen from the top and arranged to oppose the stage, and a second conductive plate which is arranged substantially parallel to the first conductive plate and has the same shape as that of the first conductive plate when seen from the top. The plurality of slots are formed in the first conductive plate. The square waveguide array includes a plurality of square waveguides aligned in their widthwise directions (X) perpendicular to there axial directions (Y). One end of each of the square waveguides is connected to the parallel-plate waveguide.
    Type: Application
    Filed: August 25, 2005
    Publication date: March 1, 2007
    Applicants: Naohisa Goto, TOHOKU UNIVERSITY, TOKYO ELECTRON LIMITED
    Inventors: Naohisa Goto, Tadahiro Ohmi, Tamotsu Morimoto
  • Publication number: 20040026039
    Abstract: A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
    Type: Application
    Filed: June 11, 2003
    Publication date: February 12, 2004
    Inventors: Naohisa Goto, Tadahiro Ohmi, Masaki Hirayama, Tetsuya Goto
  • Patent number: 6646224
    Abstract: A plasma-assisted processing system has a lifting mechanism capable of vertically moving a microwave power unit and a waveguide to adjust the level of a planar slot antenna disposed on an expanded lower end part of the waveguide. A space extending under the antenna is surrounded by a shielding member. An optical sensor having an array of photosensors is disposed on the outer side of a window formed in the side wall of a vacuum vessel to monitor the lower limit level of a cease region for a plasma (cease level). An ideal distance between the cease level and the antenna is determined beforehand and the level of the antenna is adjusted on the basis of a measured cease level so that the antenna is spaced the ideal distance apart from the cease level. Since the difference between the cease level and a level X0 for the cutoff density of an X-wave is fixed, the level X0 may be monitored instead of the cease level.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: November 11, 2003
    Assignees: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Yasuyoshi Yasaka, Makoto Ando, Naohisa Goto
  • Publication number: 20030150846
    Abstract: A plasma-assisted processing system has a lifting mechanism capable of vertically moving a microwave power unit and a waveguide to adjust the level of a planar slot antenna disposed on an expanded lower end part of the waveguide. A space extending under the antenna is surrounded by a shielding member. An optical sensor having an array of photosensors is disposed on the outer side of a window formed in the side wall of a vacuum vessel to monitor the lower limit level of a cease region for a plasma (cease level). An ideal distance between the cease level and the antenna is determined beforehand and the level of the antenna is adjusted on the basis of a measured cease level so that the antenna is spaced the ideal distance apart from the cease level. Since the difference between the cease level and a level X0 for the cutoff density of an X-wave is fixed, the level X0 may be monitored instead of the cease level.
    Type: Application
    Filed: February 3, 2003
    Publication date: August 14, 2003
    Applicant: Tokyo Electron Ltd.
    Inventors: Nobuo Ishii, Yasuyoshi Yasaka, Makoto Ando, Naohisa Goto
  • Patent number: 6528752
    Abstract: A plasma-assisted processing system has a lifting mechanism capable of vertically moving a microwave power unit and a waveguide to adjust the level of a planar slot antenna disposed on an expanded lower end part of the waveguide. A space extending under the antenna is surrounded by a shielding member. An optical sensor having an array of photosensors is disposed on the outer side of a window formed in the side wall of a vacuum vessel to monitor the lower limit level of a cease region for a plasma (cease level). An ideal distance between the cease level and the antenna is determined beforehand and the level of the antenna is adjusted on the basis of a measured cease level so that the antenna is spaced the ideal distance apart from the cease level. Since the difference between the cease level and a level X0 for the cutoff density of an X-wave is fixed, the level X0 may be monitored instead of the cease level.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: March 4, 2003
    Assignees: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Yasuyoshi Yasaka, Makoto Ando, Naohisa Goto
  • Patent number: 6522301
    Abstract: An above deck unit for an AIS (automatic identification system) is externally installed on a ship. The above deck unit includes a radio circuit and an associated antenna for transmitting and receiving a message, a position detector and an associated antenna, associated controller and power supply, and a container for storing these elements. An inboard transmission path, e.g., a cable, connects the outdoor unit for the AIS and an AIS display serving as an interface means for the crew. A signal to be transmitted through the inboard transmission path is a processed, for example, an amplified signal, rather than an unprocessed output of a VHF antenna. Therefore, problems of signal loss or degradation along the inboard transmission path are unlikely to occur. Because the unit is incorporated within a single container, it can easily be installed and transferred. With this antenna complex, it is also possible to suppress interference between antennas.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: February 18, 2003
    Assignee: Japan Radio Co., Ltd.
    Inventors: Masaki Takayama, Naoki Yokoyama, Masanori Haga, Naohisa Goto
  • Publication number: 20020050952
    Abstract: An above deck unit for an AIS (automatic identification system) is externally installed on a ship. The above deck unit includes a radio circuit and an associated antenna for transmitting and receiving a message, a position detector and an associated antenna, associated controller and power supply, and a container for storing these elements. An inboard transmission path, e.g., a cable, connects the outdoor unit for the AIS and an AIS display serving as an interface means for the crew. A signal to be transmitted through the inboard transmission path is a processed, for example, an amplified signal, rather than an unprocessed output of a VHF antenna. Therefore, problems of signal loss or degradation along the inboard transmission path are unlikely to occur. Because the unit is incorporated within a single container, it can easily be installed and transferred. With this antenna complex, it is also possible to suppress interference between antennas.
    Type: Application
    Filed: October 5, 2001
    Publication date: May 2, 2002
    Inventors: Masaki Takayama, Naoki Yokoyama, Masanori Haga, Naohisa Goto
  • Patent number: 6347602
    Abstract: In the plasma processor, the microwaves generated from a microwave generator (86) are led to a plane antenna (62), which in turn introduces exponentially attenuating microwaves into a container (22) that processes an object (W) in plasma. Microwave absorption device (96) provided in the circumference of the plane antenna (62) absorbs microwaves propagating from the center of the plane antenna (62) and suppresses the reflection. As a result, the microwaves reflected in the circumference of the plane antenna (62) and returned to the center are decreased to some degree, and the electromagnetic field distribution of the microwave becomes uniform.
    Type: Grant
    Filed: December 4, 2000
    Date of Patent: February 19, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Naohisa Goto, Makoto Ando, Nobuo Ishii
  • Patent number: 6322662
    Abstract: In a plasma treatment system, the increase of the electric field of a treatment space facing the central portion of a flat antenna member is relieved, and the ununiformity of the density of plasma in a plasma forming region is relieved. Microwave generated by a microwave generator 50 are supplied from a waveguide 52 to a flat antenna member 44. The flat antenna member 44 has a plurality of slots 60. The space between adjacent two of the slots 60 is longer than the guide wavelength of microwaves in the waveguide 52, and the length of each of the slots 60 is shorter than half of the guide wavelength. The slots 60 are arranged in a region other than the central portion of the flat antenna member 44 so as not to be axisymmetric.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: November 27, 2001
    Assignees: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Yasuo Kobayashi, Tamotsu Morimoto, Makoto Ando, Naohisa Goto
  • Patent number: 6311638
    Abstract: A plasma processing apparatus has a vacuum vessel, a high-frequency power generator that generates a high-frequency wave, a waveguide for propagating the high-frequency wave generated by the high-frequency power generator into the vacuum vessel to produce a plasma by ionizing a processing gas supplied into the vacuum vessel and to process a semiconductor wafer supported on a support table in the vacuum vessel. A reflection coefficient measuring unit 5 is combined with a waveguide 35 to take data on a ratio &Ggr;0 of advancing wave from the high-frequency power generator 4 and reflected wave from the plasma and phase &thgr; of reflection coefficient. Factors dominating the electron density of the plasma including the output power of the microwave power generator are controlled on the basis of the measured data, whereby the electron density is controlled and stable processing is ensured.
    Type: Grant
    Filed: February 9, 2000
    Date of Patent: November 6, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Nobuo Ishii, Yasuyoshi Yasaka, Makoto Ando, Naohisa Goto
  • Publication number: 20010008122
    Abstract: In a plasma processing system, microwaves generated by a microwave generator (86) are guided to a plane antenna (62) to introduce the microwaves, which are attenuated exponentially, into a processing vessel (22) in which an object to be processed (W) is subjected to a plasma process. A microwave absorbing means (96) is disposed in a peripheral portion of the plane antenna (62) to absorb the microwaves propagating from a central portion of the plane antenna and to control the amount of reflected microwave. Thus the amount of the microwaves reflected toward the central portion of the plane antenna (62) by a peripheral portion of the plane antenna (62) is reduced to some extent so that electromagnetic field intensity is distributed uniformly.
    Type: Application
    Filed: December 4, 2000
    Publication date: July 19, 2001
    Inventors: Naohisa Goto, Makoto Ando, Nobuo Ishii
  • Patent number: 5945959
    Abstract: An antenna device including a radiating conductor film having two ends adjacent to each other and connecting the two ends in a loop-like shape, formed on an upper face of a dielectric base body in a rectangular parallelepiped shape having the upper face and a lower face in a square shape in parallel with each other, a grounding conductor film extending in a planar shape formed on the lower face of the dielectric base body, and feeding conductor films and respectively connected to the two ends of the radiating conductor film 12. The feeding conductor films extend in the up and down direction in parallel with each other one of which is connected to the grounding conductor film, are formed on a side face of the dielectric base body 11. The antenna device has high directivity and efficiently transmits and receives electromagnetic waves used in communication.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: August 31, 1999
    Assignee: Mitsubishi Materials Corporation
    Inventors: Hiroaki Tanidokoro, Takeshi Aso, Naohisa Goto
  • Patent number: 5698036
    Abstract: A plasma processing apparatus comprises a processing container, a waveguide tube for guiding microwaves generated by a microwave generator, and a flat antenna member connected to the wave guide and disposed in the container to face a semiconductor wafer supported in the container. The antenna includes a plurality of short slits concentrically or spirally arranged in the antenna. The slits are spaced apart in the widthwise direction at intervals of 5% to 50% of a guide wavelength of the microwave, and each of the slits has a length of +30% of the guide wavelength centered with respect to half of the guide wavelength.
    Type: Grant
    Filed: May 24, 1996
    Date of Patent: December 16, 1997
    Assignees: Tokyo Electron Limited, Naohisa Goto, Makoto Ando, Junichi Takada, Yasuhiro Horike
    Inventors: Nobuo Ishii, Yasuo Kobayashi, Naohisa Goto, Makoto Ando, Junichi Takada, Yasuhiro Horike
  • Patent number: 5661498
    Abstract: A polarization-universal radial line slot antenna has a slot plate formed with numerous slots, a frame, and a partition plate interposed between the slot plate and the frame to form an upper layer waveguide and a lower layer waveguide. A pair of first and second feeding devices are provided in a central portion of the antenna. The first feeding device has a first matching member protruding into the upper layer waveguide for feeding thereto a radio wave diverging from a center to a periphery so that a left-hand circular polarized wave is emitted from the slots. The second feeding device has a second matching member for feeding a radio wave which passes through the lower layer waveguide and then converges from a periphery to a center of the upper layer waveguide so that a right-hand circular polarized wave is emitted from the slots. Consequently, the single antenna can concurrently transmit or receive the right-hand and left-hand circular polarized waves.
    Type: Grant
    Filed: November 18, 1994
    Date of Patent: August 26, 1997
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Naohisa Goto, Makoto Ando, Yasuhiro Okazaki
  • Patent number: 5579019
    Abstract: A slotted leaky waveguide array antenna of a one-axis tracking type wherein a feed section including a feed probe is kept in a stationary state to thereby keep a converter in a stationary state and a desired beam width is set in a tilt direction, includes a plurality of radiation waveguides arranged adjacent and parallel to each other, each of which has a plurality of slots arranged in a waveguide axial direction, and a feed waveguide for distributing to the respective radiation waveguides electromagnetic waves received through a feed section from a converter, and the antenna rotates in a substantially horizontal plane to track an azimuth direction, wherein the feed waveguide has a first section extended along one ends of the radiation waveguides and a second section extended from the feed section provided in the rotary center of the slotted leaky waveguide array antenna to the center of the first section, and wherein the radiation waveguides are formed with crossed slots having an identical offset, and the n
    Type: Grant
    Filed: December 29, 1995
    Date of Patent: November 26, 1996
    Assignees: Nippon Steel Corporation, Naohisa Goto
    Inventors: Masahiro Uematsu, Takashi Ojima, Nobuharu Takahashi, Naohisa Goto, Jiro Hirokawa, Makoto Ando
  • Patent number: 5519406
    Abstract: A low profile polarization diversity planar antenna capable of effectively separating the horizontal and vertical polarization. The antenna combines a notch antenna (A) and a patch antenna (B) in a low profile structure. The notch antenna comprises a ground plate (10), a feed plate (20), and a radiator plate (30) which are stacked in a spaced relation. The radiator plate is shorted to the ground plate at its center and formed in its periphery with at least two radial notches (38). The feed plate carries feeder probes (27) each located adjacent to each one of the notches for feeding the notch antenna. The patch antenna comprises a patch (40) stacked above the radiator plate (30). The patch (40) is grounded at one portion thereof and has a feed point spaced from the grounded portion for feeding the patch antenna. The patch is grounded to the radiator plate and has a diameter smaller than the radiator plate.
    Type: Grant
    Filed: February 16, 1995
    Date of Patent: May 21, 1996
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Katsuya Tsukamoto, Naohisa Goto, Hiroyuki Arai
  • Patent number: 5402136
    Abstract: A conductive layer is formed on one surface of an insulating substrate. Notches are formed in the conductive layer to be axially symmetric at equal angular intervals of 120.degree.. A feeding line of a notch antenna is formed on the other surface of the substrate. The feeding line has a C-shape and wide portions for adjusting the phases of excitation of the notches, and receives power at its one point. A ground plate is arranged to be parallel to the substrate. A feeding rod is connected to the conductive layer. The conductive layer and the ground plate are short-circuited by impedance matching pins. The matching pins are integrally formed with the ground plate. The notches and the feeding line constitute an notch antenna, and the feeding rod, the ground plate, the conductive layer, and the matching pins constitute a capacity loaded monopole antenna. To resonate these antennae at a plurality of resonant points, slits are formed in the conductive layer to be axially symmetric at equal angular intervals of 120.
    Type: Grant
    Filed: October 2, 1992
    Date of Patent: March 28, 1995
    Assignees: Naohisa Goto, Hiroyuki Arai, NHK Spring Co., Ltd.
    Inventors: Naohisa Goto, Hiroyuki Arai, Kiyoshi Seshimo, Mitsuo Mori, Motoaki Uchida