Abstract: Provided is a soft X-ray static electricity removal apparatus that has achieved an increase in the amount of ionized air discharged, with a simple structure. A soft X-ray static electricity removal apparatus (1) includes a soft X-ray generation device (90), a container (10), a soft X-ray shielding sheet (20), and an insulating layer (50). The soft X-ray generation device generates soft X-rays (92). The container (10) has an outlet (12) from which ionized air (100) that has been ionized with the soft X-rays flows out. The soft X-ray shielding sheet (20) is used at the outlet of the container and includes a first outer sheet (30), an interlayer sheet (34), and a second outer sheet (40) which are formed of a material opaque to the soft X-rays.

Abstract: Provided is a soft X-ray static electricity removal apparatus that has achieved an increase in the amount of ionized air discharged, with a simple structure. A soft X-ray static electricity removal apparatus (1) includes a soft X-ray generation device (90), a container (10), a soft X-ray shielding sheet (20), and an insulating layer (50). The soft X-ray generation device generates soft X-rays (92). The container (10) has an outlet (12) from which ionized air (100) that has been ionized with the soft X-rays flows out. The soft X-ray shielding sheet (20) is used at the outlet of the container and includes a first outer sheet (30), an interlayer sheet (34), and a second outer sheet (40) which are formed of a material opaque to the soft X-rays.

Abstract: An apparatus for charging dry air or nitrogen gas into a container for storing semiconductor wafers can remove chemical gas and moisture from the container, and then prevent acid from being generated at the surfaces of the wafers. The apparatus A for charging dry air or nitrogen gas into a container 1 for storing semiconductor wafers 9 is connected to an opening 8a, acting as an intake, and to an opening 8b, acting as an exhaust, wherein the container 1 comprises a plurality of openings 8 disposed at the bottom plate of the container 1, the apparatus comprising: PTFE filters 7 disposed at the plurality of openings 8a, 8b, a portion 11 for providing the dry air or nitrogen gas to the container 1, and a portion 12 for exhausting the used dry air or nitrogen gas from the container 1 after removing chemical gas and moisture from the container, and then preventing acid from being generated at the surfaces of the wafers 9.

Abstract: A remover that removes the static charges on surfaces of substrates of semiconductors and liquid crystals in the processes for manufacturing them is provided. A cylindrical filter in the remover cannot be affected by soft X-rays, and the X-rays cannot leak outside the guiding vessel. A portion 1 for generating purified air that comprises a cylindrical filter 5, a portion 2 for irradiation of soft X-rays 19, and a portion 3 for blowing out the ionized purified air, are arranged in the direction of the air flow in a guiding vessel 4. Also, a shield 23 prevents the portion 1 for generating purified air from being exposed to the irradiation. Further, the portion 3 has a construction wherein the ionized purified air 35 is blown at an equal rate of flow along the longitudinal direction of the remover and prevents the soft X-rays 19 from leaking outside the guiding vessel 4.