Abstract: Disclosed is a process for producing manganese fluoride, comprising a step (1) of allowing a manganese compound such as MnF2 having been dried at a temperature of not lower than 100° C. to react with a fluorinating agent such as F2 at a temperature of 50 to 250° C. and a step (2) of further allowing a product obtained in the step (1) to react with a fluorinating agent at a temperature of 250 to 450° C. According to this process, manganese fluoride capable of generating a fluorine gas can be easily and inexpensively produced on a mass scale under the conditions of low temperature and low pressure without going through steps of sublimation and solidification.

Abstract: Disclosed is a process for producing manganese fluoride, comprising a step (1) of allowing a manganese compound such as MnF2 having been dried at a temperature of not lower than 100° C. to react with a fluorinating agent such as F2 at a temperature of 50 to 250° C. and a step (2) of further allowing a product obtained in the step (1) to react with a fluorinating agent at a temperature of 250 to 450° C. According to this process, manganese fluoride capable of generating a fluorine gas can be easily and inexpensively produced on a mass scale under the conditions of low temperature and low pressure without going through steps of sublimation and solidification.