Patents by Inventor Naoki Date

Naoki Date has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6953939
    Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: October 11, 2005
    Assignee: Sony Corporation
    Inventors: Tetsuo Abe, Kouki Okawauchi, Tadashi Hattori, Hironori Fujita, Minoru Takeda, Yuichi Aki, Naoki Date, Setsuo Norioka, Toshiaki Miyokawa, Seiichi Nakagawa
  • Patent number: 6831278
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: December 14, 2004
    Assignees: Sony Corporation, JEOL Ltd.
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date
  • Publication number: 20040144928
    Abstract: A testing apparatus using a scanning electron microscope for enabling tests and measurements on any part of a test subject in a nondestructive way without being limited by a size of the test subject, which is, a testing apparatus 1 using a scanning electron microscope for performing tests and measurements on any part of a test subject in a nondestructive way by using a scanning electron microscope 6a, comprising a local vacuum formation portion 9 for forming a local vacuum region by blocking around a part to be tested of the test subject from the outside air, wherein the local vacuum formation portion comprises an exhaust portion for exhausting to form a partial vacuum region, a float means 14 for floating the whole local vacuum formation portion above the test subject by emitting a compressed gas to an outer circumference portion of the local vacuum formation portion and a length measuring means 16 for measuring a distance between the test subject and the local vacuum formation portion for controlling floati
    Type: Application
    Filed: February 17, 2004
    Publication date: July 29, 2004
    Inventors: Tetsuo Abe, Kouki Okawauchi, Tadashi Hattori, Hironori Fujita, Minoru Takeda, Yuichi Ak, Naoki Date, Setsuo Norioka, Toshiaki Miyokawa, Seiichi Nakagawa
  • Patent number: 6737660
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: May 18, 2004
    Assignees: Sony Corporation, Jeol Ltd.
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • Patent number: 6734437
    Abstract: An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.
    Type: Grant
    Filed: February 25, 2003
    Date of Patent: May 11, 2004
    Assignees: JEOL Ltd., Sony Corporation
    Inventors: Setsuo Norioka, Toshiaki Miyokawa, Naoki Date, Jun Sasaki, Yuichi Aki, Yoshihisa Miura
  • Publication number: 20030178581
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Application
    Filed: February 24, 2003
    Publication date: September 25, 2003
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • Publication number: 20030178582
    Abstract: An electron beam irradiation system for shooting an electron beam at a master disk to make recordings. This system is capable of focusing the beam easily and accurately in a corresponding manner to the master disk, thus permitting accurate recordings. The system has a support mechanism portion holding the master disk on it. The support mechanism portion has a slide table on which a focusing stage is placed. The focusing stage has a knife edge and a Faraday cup. The knife edge is located immediately beside the master disk. When recordings are made, an electron beam is first shot at the focusing stage and brought to focus. Then, the beam is shot at the master disk, thus making recordings.
    Type: Application
    Filed: February 25, 2003
    Publication date: September 25, 2003
    Applicants: JEOL LTD., SONY CORPORATION
    Inventors: Setsuo Norioka, Toshiaki Miyokawa, Naoki Date, Jun Sasaki, Yuichi Aki, Yoshihisa Miura
  • Publication number: 20030116718
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Application
    Filed: November 1, 2002
    Publication date: June 26, 2003
    Applicant: SONY CORPORATION
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date
  • Patent number: 6021295
    Abstract: A developing apparatus employing a three-pole stationary magnetic roller for use with a uni-component magnetic developer or toner. The apparatus includes a rotational sleeve which accommodates the stationary roller, a mixer disposed in a toner vessel for stirring the toner, and a toner layer thickness regulator disposed upstream in the sleeve rotation direction from the developing position at which the image on a photo-sensitive drum is developed. The magnetic roller has a developing pole located near the developing position, a blade-facing pole facing the toner layer thickness regulator, and a shield pole located downstream in the sleeve rotation direction from the developing position, where the blade-facing pole and the shield pole are of the opposite polarity to the developing pole. The blade-facing pole and the shield pole generate a repulsive magnetic field therebetween, where the toner that has been stirred in the vessel comes in contact with the sleeve.
    Type: Grant
    Filed: May 28, 1998
    Date of Patent: February 1, 2000
    Assignee: Kyocera Corporation
    Inventors: Eiji Ochiai, Shigeki Tsukahara, Makoto Hamaguchi, Naoki Date
  • Patent number: 4439681
    Abstract: A charged particle beam scanning device is provided with two coordinates conversion circuits. For rotating the scanning direction of the charged particle beam, one of the coordinates conversion circuit is connected between a scanning signal generator and a magnification circuit, the output of which is supplied to a deflecting means for scanning the charged particle beam over the specimen surface, as in the case of a conventional device. Another coordinates conversion circuit is used for keeping independent operation of the image rotation and the image shift. This coordinates conversion circuit converts the output signal of a d.c. signal generator for image shift, and the converted signal is added to the input signal of the said magnification circuit.
    Type: Grant
    Filed: October 20, 1981
    Date of Patent: March 27, 1984
    Assignee: Jeol Ltd.
    Inventors: Setsuo Norioka, Naoki Date
  • Patent number: 4431915
    Abstract: An upper deflection coil comprising a toroidal coil. A lower deflection coil comprising a saddle-shaped coil to minimize the combined inductance of the upper and lower deflection coils. A single scanning signal generator which supplies the deflection coils with scanning signals having different frequencies, ranging from low scanning speeds to television scanning speeds. Thus, no image shift occurs when changing scanning speeds in between television scanning speeds and other scanning speeds.
    Type: Grant
    Filed: November 19, 1981
    Date of Patent: February 14, 1984
    Assignee: Jeol Ltd.
    Inventors: Seiichi Nakagawa, Yoshio Ishimori, Naoki Date