Patents by Inventor Naoki Funabashi

Naoki Funabashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11774850
    Abstract: A method of disposing a substrate on a holding unit using a pattern forming apparatus which forms a pattern on the substrate, the pattern forming apparatus comprising: a stage, the holding unit removably attached to the stage and configured to suck and hold the substrate, an optical system, and configured to detect an alignment mark of the substrate from a suction surface side of the substrate, the optical system having plural optical elements, and a detection unit configured to detect a reference mark for measuring a position of a detection field of the optical system, the method comprising: detecting a position of the reference mark, and disposing the substrate on the holding unit using the detected position of the reference mark so that the alignment mark of the substrate detected from the suction surface side of the substrate by the optical system is disposed in the detection field.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: October 3, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Naoki Funabashi
  • Patent number: 10948829
    Abstract: A pattern forming apparatus configured to form a pattern on a substrate includes a holding portion configured to hold the substrate by suction, an optical system configured to detect, from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield light entering the optical system.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: March 16, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Naoki Funabashi
  • Publication number: 20210033967
    Abstract: A method of disposing a substrate on a holding unit using a pattern forming apparatus which forms a pattern on the substrate, the pattern forming apparatus comprising: a stage, the holding unit removably attached to the stage and configured to suck and hold the substrate, an optical system, and configured to detect an alignment mark of the substrate from a suction surface side of the substrate, the optical system having plural optical elements, and a detection unit configured to detect a reference mark for measuring a position of a detection field of the optical system, the method comprising: detecting a position of the reference mark, and disposing the substrate on the holding unit using the detected position of the reference mark so that the alignment mark of the substrate detected from the suction surface side of the substrate by the optical system is disposed in the detection field.
    Type: Application
    Filed: October 2, 2020
    Publication date: February 4, 2021
    Inventor: Naoki Funabashi
  • Patent number: 10501635
    Abstract: To provide magnesium oxide which is excellent in hydration resistance and hardly causes volume expansion due to hydration and the like, a resin composition containing the same, and a method for producing the magnesium oxide powder. Magnesium oxide powder having a coating layer mainly comprising basic magnesium carbonate in the surface layer, when the amounts of substances of water vapor and carbon dioxide among the gas generated by thermal decomposition at 50 to 500° C. are respectively designated as m-H2O and m-CO2, in a heating evolved gas analysis (EGA-MS) method, the molar fraction represented by m-CO2/(m-H2O+m-CO2) being within the range of 0.3 to 0.6.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: December 10, 2019
    Assignee: UBE MATERIAL INDUSTRIES, LTD.
    Inventors: Naoto Nishida, Tatsuki Okutsu, Naoki Funabashi, Akira Yoshida
  • Patent number: 10431463
    Abstract: A substrate holding device and a lithography apparatus that is advantageous for separation of a substrate from a seal member in a short time when the substrate is carried out. The substrate holding device including a holding member having a center part, an intake hole where air is exhausted from a space between the substrate and the holding member, an outer peripheral part provided at a position lower than the center part to surround the center part, and a seal member in the holding member to define a space.
    Type: Grant
    Filed: December 9, 2015
    Date of Patent: October 1, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Naoki Funabashi
  • Publication number: 20190265595
    Abstract: A pattern forming apparatus configured to form a pattern on a substrate includes a holding portion configured to hold the substrate by suction, an optical system configured to detect, from a suction surface side of the substrate, an alignment mark provided to the substrate held by the holding portion, and a unit configured to shield light entering the optical system.
    Type: Application
    Filed: February 25, 2019
    Publication date: August 29, 2019
    Inventor: Naoki Funabashi
  • Publication number: 20180044530
    Abstract: To provide magnesium oxide which is excellent in hydration resistance and hardly causes volume expansion due to hydration and the like, a resin composition containing the same, and a method for producing the magnesium oxide powder. Magnesium oxide powder having a coating layer mainly comprising basic magnesium carbonate in the surface layer, when the amounts of substances of water vapor and carbon dioxide among the gas generated by thermal decomposition at 50 to 500° C. are respectively designated as m-H2O and m-CO2, in a heating evolved gas analysis (EGA-MS) method, the molar fraction represented by m-CO2/(m-H2O+m-CO2) being within the range of 0.3 to 0.6.
    Type: Application
    Filed: March 2, 2016
    Publication date: February 15, 2018
    Applicant: Ube Material Industries, Ltd.
    Inventors: Naoto Nishida, Tatsuki Okutsu, Naoki Funabashi, Akira Yoshida
  • Publication number: 20170351173
    Abstract: A pattern forming apparatus which forms a pattern on a substrate, which includes a movable stage, a holding unit removably attached to the stage and configured to suck and hold the substrate, an optical system of which position with respect to the holding unit is fixed, and configured to detect an alignment mark of the substrate which is sucked by the holding unit from a suction surface side of the substrate, a reference mark for measuring a position of a detection field of the optical system, and a detection system configured to detect the reference mark. The substrate is disposed on the holding unit in accordance with the position of the reference mark detected by the detection system so that the alignment mark of the substrate detected from the suction surface side of the substrate by the optical system is disposed in the detection field of the optical system.
    Type: Application
    Filed: May 26, 2017
    Publication date: December 7, 2017
    Inventor: Naoki Funabashi
  • Patent number: 9740109
    Abstract: A holding device includes a holding member having holes for evacuating air in a space between a substrate and the holding member and an annular seal member on a lower surface of a stepped portion of the holding member for defining the space. A first region is the area of a figure having the same center as that of a plane figure of a surface of the holding member and obtained by reducing the plane figure's size by ? or more and ? or less. A second region is between the first region and the seal member. The holes are formed to satisfy a relationship of (total hole area in second region/area of second region)>(total hole area in sum region of first and second regions/area of sum region of first and second regions) and communicate with a pipe at a position corresponding to the first region of the holding member.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: August 22, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventor: Naoki Funabashi
  • Publication number: 20160170313
    Abstract: A substrate holding device and a lithography apparatus that is advantageous for separation of a substrate from a seal member in a short time when the substrate is carried out. The substrate holding device including a holding member having a center part, an intake hole where air is exhausted from a space between the substrate and the holding member, an outer peripheral part provided at a position lower than the center part to surround the center part, and a seal member in the holding member to define a space.
    Type: Application
    Filed: December 9, 2015
    Publication date: June 16, 2016
    Inventor: Naoki Funabashi
  • Publication number: 20160154313
    Abstract: A holding device includes a holding member having holes for evacuating air in a space between a substrate and the holding member and an annular seal member on a lower surface of a stepped portion of the holding member for defining the space. A first region is the area of a figure having the same center as that of a plane figure of a surface of the holding member and obtained by reducing the plane figure's size by ? or more and ? or less. A second region is between the first region and the seal member. The holes are formed to satisfy a relationship of (total hole area in second region/area of second region)>(total hole area in sum region of first and second regions/area of sum region of first and second regions) and communicate with a pipe at a position corresponding to the first region of the holding member.
    Type: Application
    Filed: November 20, 2015
    Publication date: June 2, 2016
    Inventor: Naoki Funabashi
  • Publication number: 20100055460
    Abstract: A fine alkaline earth metal carbonate powder showing high dispersibility, in which the alkaline earth metal carbonate is selected from the group consisting of strontium carbonate and barium carbonate, can be prepared by a process comprising the steps of pulverizing a powder of strontium carbonate or barium carbonate in an aqueous medium using ceramic beads having a mean diameter of 10 to 1,000 ?m in the presence of a polymer comprising a polycarboxylic acid or anhydride thereof having a side chain of a polyoxyalkylene group, and drying the pulverized powder.
    Type: Application
    Filed: March 12, 2008
    Publication date: March 4, 2010
    Applicant: UBE MATERIAL INDUSTRIES, LTD.
    Inventors: Yojiro Ichimura, Takashi Watanabe, Fumio Okada, Naoki Funabashi