Patents by Inventor Naoki Hisamatsu

Naoki Hisamatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive type photosensitive composition
    Patent number: 6143471
    Abstract: There is disclosed a positive type photosensitive composition which comprises a support, and a recording layer provided thereon containing at least a polymer which is soluble in an alkaline developer, a near infrared rays-absorbing dye, and a compound which lowers solubility of the polymer in the alkaline developer, wherein a contact angle of the recording layer is 70.degree. or higher and the contact angle is lowered by irradiating a near infrared rays laser.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: November 7, 2000
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Masakazu Takata, Naoki Hisamatsu